专利检索 ap:("Eung Do KIM" OR "Won Jong KIM" OR "Kyu Hwan HWANG" OR "Seok Gyu YOON" OR "Dong Chan KIM" OR "Bo Ra JUNG" OR "Dong Kyu SEO" OR "Young Woo SONG" OR "Jong Hyuk LEE") AND inv:"Young Woo SONG" 第 1 页

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发明申请
MASK, METHOD OF CLEANING THE MASK, AND METHOD OF MANUFACTURING A PLURALITY OF ORGANIC ELECTROLUMINESCENT ELEMENTS USING THE MASK 审中-公开
标题翻译：掩模，清洁方法和使用掩模制造有机电致发光元件的多样性的方法

公开(公告)号：US20140186983A1

公开(公告)日：2014-07-03

申请号：US13944007

申请日：2013-07-17

申请人： Eung Do KIM , Won Jong KIM , Kyu Hwan HWANG , Seok Gyu YOON , Dong Chan KIM , Bo Ra JUNG , Dong Kyu SEO , Young Woo SONG , Jong Hyuk LEE

发明人： Eung Do KIM , Won Jong KIM , Kyu Hwan HWANG , Seok Gyu YOON , Dong Chan KIM , Bo Ra JUNG , Dong Kyu SEO , Young Woo SONG , Jong Hyuk LEE

IPC分类号： H01L51/00

CPC分类号： H01L51/0023 , G03F1/82 , Y10T428/31678

摘要： A method of cleaning a mask includes preparing a mask on which a first metal layer and a second metal layer are stacked sequentially, and lifting off the second metal layer by removing the first metal layer.

摘要翻译： 一种清洁掩模的方法包括：准备一个其上依次层叠有第一金属层和第二金属层的掩模，并且通过去除第一金属层来提起第二金属层。