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公开(公告)号:US10479722B2
公开(公告)日:2019-11-19
申请号:US15510393
申请日:2015-09-01
申请人: Evonik Degussa GmbH
IPC分类号: C03C17/00 , C09D183/04 , C23C18/12 , C09D7/61 , G03F7/11 , G03F7/16 , G03F7/20 , G03F7/32 , G03F7/42 , B05D1/32 , C08K3/22
摘要: The present invention, relates, to a process, for producing structured coatings, in which a coating composition comprising at least one inorganic binder, at least one oxide pigment which, after addition of a mixture consisting of 15 ml of 1 M oxalic acid and 15 ml of 20% aqueous hydrochloric acid based on 1 g of substance, under standard conditions, leads to a temperature rise of at least 4° C., and at least one solvent is applied to a substrate, the resulting coating composition film is partially coated with a photoresist and the substrate coated with the coating composition and the photoresist is treated with an acid, to the structured layers obtainable by the process and to the use thereof.