-
公开(公告)号:US20240065658A1
公开(公告)日:2024-02-29
申请号:US18457310
申请日:2023-08-28
Applicant: FUJIFILM Corporation
Inventor: Daisuke OGAWA , Kohei OTA , Takeyasu KOBAYASHI , Sayaka SAITO
IPC: A61B6/00
CPC classification number: A61B6/4488 , A61B6/502
Abstract: A mammography apparatus includes: an arm; a first cooling fan that is disposed on a stand side with respect to the radiation source in the arm, sucks air from an outside of the arm, and discharges air that has cooled the radiation source from a first exhaust port provided on the stand side with respect to the radiation source; a projector that is disposed in the arm; a second cooling fan that is disposed between the projector and the first exhaust port in the arm, sucks a part of air directed from the first cooling fan to the first exhaust port, blows the sucked air toward the projector to cool the projector, and has a flow rate smaller than that of the first cooling fan; and a second exhaust port that is provided separately from the first exhaust port and through which air that has cooled the projector is discharged.
-
公开(公告)号:US20220099847A1
公开(公告)日:2022-03-31
申请号:US17458482
申请日:2021-10-13
Applicant: FUJIFILM CORPORATION
Inventor: Hisatsugu HORIUCHI , Kotatsu KAWAGUCHI , Masateru TATEISHI , Shinsuke NOGUCHI , Daisuke OGAWA
IPC: G01T1/20
Abstract: A radiography apparatus includes a substrate on which a pixel region in which a plurality of pixels that accumulate charges generated in response to incident radiations are arranged is formed on one surface of a flexible base material, a housing which accommodates the substrate and includes a front portion having an incident surface through which the radiations are incident on the substrate, a first buffer layer which is disposed between the front portion and the substrate in a thickness direction of the housing, the first buffer layer having an outer circumference provided inside the pixel region of the substrate in a plan view, and a structure which is disposed between the front portion and the substrate in the thickness direction at a position overlapping with the first buffer layer.
-