公开(公告)号：US20230042114A1

公开(公告)日：2023-02-09

申请号：US17897718

申请日：2022-08-29

Applicant: FUJIFILM Corporation

Inventor： Fumiko TSUNA ,  Toshihiro KARIYA ,  Shota SUZUKI

IPC: C09D11/54 ,  C09D11/033 ,  C09D11/107 ,  C09D11/40 ,  B41M5/00

Abstract: A pretreatment liquid for an impermeable base material includes an anionic resin, and an aqueous medium, in which the anionic resin has a Clog P value of 1.40 or greater, and a content of a structural unit derived from an alkyl (meth)acrylate containing a chain alkyl group having 2 or more carbon atoms in the anionic resin is less than 5% by mass with respect to a total mass of the anionic resin.