公开(公告)号：US20190173013A1

公开(公告)日：2019-06-06

申请号：US16270289

申请日：2019-02-07

Applicant: FUJIFILM Corporation

Inventor： Seigo NAKAMURA ,  Hiroyuki YAEGASHI

IPC: H01L51/00 ,  H01L29/786

Abstract: Provided is a method of producing a high-quality film having a thin film and high uniformity in film thickness or the like. The method of producing a film includes supplying a raw material solution containing a solvent and a material that forms a film onto a substrate and drying the solvent to form the film on the substrate. A coating blade holding the raw material solution on the substrate is used, and the coating blade has a facing surface which faces a surface of the substrate and at least one side surface which is provided in the periphery of the facing surface and is in contact with the raw material solution. The solvent of the raw material solution is dried along a specific direction to form the film.