公开(公告)号：US20140001675A1

公开(公告)日：2014-01-02

申请号：US14019622

申请日：2013-09-06

Applicant: FUJIFILM Corporation

Inventor： Kazuharu NAKAMURA ,  Satoshi WAKAMATSU

IPC: B29C59/02

CPC classification number: B29C59/022 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: In a nanoimprinting method, an assembly, of which the entire surface is directly exposable to the environment, is supported by a pressure vessel by a support member such that fluid pressure from the environment operates on the entire surface of the assembly. Gas is introduced into the pressure vessel, and fluid pressure exerted by the gas presses a mold and a substrate against each other. Thereby, pressing with uniform pressure onto a curable resin coated surface can be realized in nanoimprinting that employs a mesa type mold and/or a mesa type substrate to be processed, and the occurrence of residual film fluctuations can be suppressed.

Abstract translation: 在纳米压印方法中，整个表面直接暴露于环境的组件由压力容器由支撑构件支撑，使得来自环境的流体压力在组件的整个表面上操作。 将气体引入压力容器中，并且由气体施加的流体压力将模具和基板彼此压制。 由此，可以在使用台面型模具和/或台面型基板进行加工的纳米压印中实现均匀的压力压在可固化树脂涂覆表面上，并且可以抑制残留膜波动的发生。

公开(公告)号：US20140209565A1

公开(公告)日：2014-07-31

申请号：US14228501

申请日：2014-03-28

Applicant: FUJIFILM Corporation

Inventor： Kazuharu NAKAMURA ,  Satoshi WAKAMATSU

IPC: B29C59/00 ,  B29C59/02

CPC classification number: B29C59/002 ,  B29C33/58 ,  B29C39/026 ,  B29C43/021 ,  B29C59/02 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/161

Abstract: A nanoimprinting mold includes: a mold main body having a fine pattern of protrusions and recesses on a surface thereof; and a mold release layer formed on the surface of the mold main body. The mold release layer is formed within a mold release layer forming region, which is a region of the mold main body that includes a patterned region where the fine pattern of protrusions and recesses is formed and has an outer edge positioned outside the outer edge of the patterned region. An outer peripheral mold release layer has a thickness distribution in which the thickness of the outer peripheral mold release layer is locally maximal at positions outside the outer edge of the patterned region, substantially continuously along the entire periphery. Thereby, it becomes possible to restrict the region in which resist flows during nanoimprinting, without employing a mesa type substrate.

Abstract translation: 纳米压印模具包括：模具主体，其表面上具有突出和凹陷的精细图案; 以及形成在模具主体的表面上的脱模层。 脱模层形成在脱模层形成区域内，脱模层形成区域是模具主体的区域，其包括形成有突出和凹部的精细图案的图案区域，并且具有位于外部边缘外侧的外边缘 图案区域。 外周脱模层具有厚度分布，其中外周脱模层的厚度在图案化区域的外边缘外部的位置处局部最大，沿着整个周边大致连续。 由此，可以在不使用台面型基板的情况下限制抗蚀剂在纳米压印过程中流动的区域。