公开(公告)号：US20250017209A1

公开(公告)日：2025-01-16

申请号：US18890032

申请日：2024-09-19

Applicant: FUJIFILM Corporation

Inventor： Tadashi INABA ,  Naotsugu Muro ,  Tetsuya Kamimura ,  Naoko Ouchi

IPC: A01N43/80 ,  A01N25/02 ,  A01N31/08 ,  A01N33/12 ,  A01N37/06 ,  A01N37/16 ,  A01N41/06 ,  A01N43/16 ,  A01N47/44 ,  B24B37/04 ,  C11D7/26 ,  C11D7/32 ,  C11D7/34 ,  C11D7/36 ,  H01L21/02 ,  H01L21/306

Abstract: The present invention provides a composition that suppresses the occurrence of defects in an object to be applied, even in a case of being used after a predetermined period of time has elapsed from the production. In addition, the present invention provides a manufacturing method for a semiconductor element and a cleaning method for a semiconductor substrate.
The composition according to the present invention is a composition containing an antibacterial agent, an organic acid, an organic amine, and water, in which a content of the water is 70% by mass or more with respect to a total mass of the composition, and a pH at 25° C. is 4.0 to 9.0.