FLOW RATE CONTROL DEVICE, AND FLOW RATE CONTROL METHOD

    公开(公告)号:US20230021102A1

    公开(公告)日:2023-01-19

    申请号:US17784011

    申请日:2020-12-03

    Abstract: A flow rate control device 100 includes a flow rate control valve 8 having a valve element 8a and a piezoelectric element 8b for moving the valve element, and a control circuit 9 for controlling an operation of the flow rate control valve 8, wherein, in order to perform a pulsed fluid supply, the control circuit 9 is configured so as to open-loop control an applied voltage to the piezoelectric element so that it approaches the target voltage after once applying a voltage V1 exceeding a target voltage V0 corresponding to a target displacement of the piezoelectric element, when a pulsed flow rate setting signal is given.

    SELF-DIAGNOSIS METHOD FOR FLOW RATE CONTROL DEVICE

    公开(公告)号:US20200348158A1

    公开(公告)日:2020-11-05

    申请号:US16765153

    申请日:2018-11-20

    Abstract: A self-diagnosis method of a flow rate control device includes: a step (a) for measuring a pressure drop characteristic after a pressure control valve (6) has been changed to a closed state from a state where a fluid flows from the upstream side of the pressure control valve with the opening of a flow rate control valve (8) is larger than a restriction part; a step (b) for measuring the pressure drop characteristic after the pressure control valve has been changed to the closed state from a state where the fluid flows from the upstream side of the flow rate control valve to the downstream side with the opening of the flow rate control valve is smaller than the restriction part; a step (c) for determining whether there is an abnormality by comparing the pressure drop characteristic measured in step (a) with a corresponding reference pressure drop characteristic; a step (d) for determining whether there is an abnormality by comparing the pressure drop characteristic measured in step (b) with a corresponding reference pressure drop characteristic; and a step (e) for determining that there is an abnormality in the flow rate control valve when it is determined that there is an abnormality only in the step (d).

    FLOW RATE CONTROL DEVICE
    5.
    发明申请

    公开(公告)号:US20200348704A1

    公开(公告)日:2020-11-05

    申请号:US16760726

    申请日:2018-11-20

    Abstract: A flow rate control device (100) comprises: a pressure control valve (6) provided in a flow path; a flow rate control valve (8) provided downstream side of the pressure control valve; and a first pressure sensor (3) for measuring pressure on the downstream side of the pressure control valve and on the upstream side of the flow rate control valve. The flow rate control valve has a valve element (13) seated on/separated from a valve seat (12); a piezoelectric element (10b) for moving the valve element so as be seated on/separated from the valve seat; and a strain sensor (20) provided on a side surface of the piezoelectric element. The pressure control valve (6) is configured to control the pressure control valve (6) on the basis of a signal output from the first pressure sensor (3), and to control the driving of the piezoelectric element of the flow rate control valve (8) based on a signal output from the strain sensor (20).

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