POWER SEMICONDUCTOR DEVICE AND A METHOD OF FORMING A POWER SEMICONDUCTOR DEVICE
    1.
    发明申请
    POWER SEMICONDUCTOR DEVICE AND A METHOD OF FORMING A POWER SEMICONDUCTOR DEVICE 有权
    功率半导体器件和形成功率半导体器件的方法

    公开(公告)号:US20100032712A1

    公开(公告)日:2010-02-11

    申请号:US12186231

    申请日:2008-08-05

    摘要: A power semiconductor device has a top surface and an opposed bottom surface below a part of which is a thick portion of semiconductor substrate. At least a portion of a drift region of the device has either no or only a thin portion of semiconductor substrate positioned thereunder. The top surface has a high voltage terminal and a low voltage terminal connected thereto to allow a voltage to be applied laterally across the drift region. At least two MOS (metal-oxide-semiconductor) gates are provided on the top surface. The device has at least one relatively highly doped region at its top surface extending between and in contact with said first and second MOS gates. The device has improved protection against triggering of parasitic transistors or latch-up without the on-state voltage drop or switching speed being compromised.

    摘要翻译: 功率半导体器件具有顶表面和相对的底表面,其下面的一部分是半导体衬底的厚部分。 装置的漂移区域的至少一部分具有没有或仅有半导体衬底的薄的部分位于其下方。 顶表面具有高电压端子和与其连接的低电压端子,以允许跨越漂移区域横向施加电压。 在顶表面上设置至少两个MOS(金属氧化物半导体)栅极。 器件在其顶表面处具有至少一个相对高度掺杂的区域,其在所述第一和第二MOS栅极之间延伸并与之接触。 该器件具有改进的防止寄生晶体管触发或闩锁的保护,而不会导致导通电压降或开关速度受损。