公开(公告)号：US20070188724A1

公开(公告)日：2007-08-16

申请号：US11353249

申请日：2006-02-14

申请人： Fransicus Jacobs ,  Marcel Baggen ,  Erik Loopstra ,  Harmen Schoot ,  Arjan Bakker ,  Arjan Wel ,  Krijn Bustraan

发明人： Fransicus Jacobs ,  Marcel Baggen ,  Erik Loopstra ,  Harmen Schoot ,  Arjan Bakker ,  Arjan Wel ,  Krijn Bustraan

IPC分类号： G03B27/42

CPC分类号： G03F7/70716 ,  G03F7/70358 ,  G03F7/707

摘要： A lithographic apparatus includes a support constructed to support a patterning device. The patterning device is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The support includes a force actuator device to exert a force onto the patterning device in a direction of movement of the support. The force actuator device includes a movable part which is pivotably about a pivot axis and thereby connected to the support. The movable part is in the direction of movement of the support substantially balanced with respect to the pivot axis. The force actuator device further includes an actuator to exert via the movable part the force onto the patterning device, to at least partly compensate for the information or a risk of slippage due to acceleration of the support in the direction of movement.

摘要翻译： 光刻设备包括构造成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束。 该支撑件包括一个力促动器装置，以在支撑件的移动方向上向图案形成装置施加力。 力致动器装置包括可枢转地围绕枢转轴线并由此连接到支撑件的可移动部件。 可移动部分在支撑件的运动方向上相对于枢转轴线基本平衡。 力致动器装置还包括致动器，其经由可移动部件施加力到图案形成装置上，以至少部分地补偿信息或由于支撑件沿着移动方向的加速而导致的滑动的风险。