Sensor for Lithographic Apparatus and Method of Obtaining Measurements of Lithographic Apparatus
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    发明申请
    Sensor for Lithographic Apparatus and Method of Obtaining Measurements of Lithographic Apparatus 有权
    用于平版印刷设备的传感器和获得光刻设备测量的方法

    公开(公告)号:US20070273869A1

    公开(公告)日:2007-11-29

    申请号:US10582247

    申请日:2004-12-09

    IPC分类号: G01B9/00

    CPC分类号: G03F7/70591 G03F7/7085

    摘要: A sensor arrangement may be used to measure properties, such as optical properties, of a device arranged to process substrates. The sensor arrangement includes a substrate having the following: a plurality of sensor elements provided as an integrated circuit in the substrate, for each one of the plurality of sensor elements associated electronic circuitry comprising a processing circuit connected to the sensor element and an input/output interface connected to the processing circuit, and a power supply unit configured to supply operating power only to the electronic circuitry associated with one or more of the plurality of sensor elements which are in use. The at least one sensor element and possibly the processing electronics, the input/output unit, and/or the power supply unit may be provided as one or more integrated circuits or other structures in the substrate.

    摘要翻译: 可以使用传感器装置来测量布置成处理衬底的器件的性质,例如光学性质。 所述传感器装置包括具有以下基板:多个传感器元件,作为所述基板中的集成电路设置,所述多个传感器元件中的每一个相关联的电子电路包括连接到所述传感器元件的处理电路和输入/输出 接口连接到处理电路,以及电源单元,被配置为仅向与所使用的多个传感器元件中的一个或多个相关联的电子电路提供工作电力。 至少一个传感器元件以及可能的处理电子器件,输入/输出单元和/或电源单元可以被提供为衬底中的一个或多个集成电路或其他结构。