公开(公告)号：US20200230780A1

公开(公告)日：2020-07-23

申请号：US16650597

申请日：2018-10-12

申请人： Fujibo Holdings, Inc.

发明人： Hirohito MIYASAKA ,  Teppei TATENO ,  Ryuma MATSUOKA ,  Hiroshi KURIHARA ,  Takumi MIKUNI

IPC分类号： B24B37/24 ,  H01L21/304 ,  B24B37/26 ,  B24D3/28

摘要： A polishing pad includes: a polishing layer having a polyurethane sheet containing substantially spherical cells, wherein E′(90%)/E′(30%) falls within a range of 0.4 to 0.7, where E′(90%) represents a storage modulus of the polyurethane sheet that has been exposed to an environment with a temperature of 23° C. and a relative humidity of 90%, as measured in a tension mode at 40° C. with an initial load of 148 g, a strain range of 0.1%, and a measurement frequency of 1.6 Hz, and E′(30%) represents a storage modulus of the polyurethane sheet that has been exposed to an environment with a temperature of 23° C. and a relative humidity of 30%, as measured in a tension mode at 40° C. with an initial load of 148 g, a strain range of 0.1%, and a measurement frequency of 1.6 Hz. Also provided is a method for manufacturing the polishing pad.