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公开(公告)号：US11883928B2
公开(公告)日：2024-01-30
申请号：US17322247
申请日：2021-05-17
发明人： Feng Zhang , Ming Luo , Ai-Jun Tang , Jian-Jun Meng
摘要： A mechanism for polishing includes a polishing member, an eccentric member coupled to the polishing member, and a driving member coupled to the eccentric member. The driving member drives the eccentric member to rotate to move the polishing member to reciprocate in the one-dimensional direction, so that when a relative position between the polishing mechanism and the workpiece is fixed, the polishing member polishes a workpiece by translating a polishing surface. A method for the polishing process, applied by a polishing device, is also disclosed. By using the polishing mechanism, the entirety of the polishable surface of the workpiece can be covered, and collapsed edges of the workpiece are avoided.
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公开(公告)号：US12122088B2
公开(公告)日：2024-10-22
申请号：US17687922
申请日：2022-03-07
发明人： Jian-Wen Gao , Ting-Ting Li , Chu-Hui Wu , Ai-Jun Tang , Hui Wang , Shi Chen , Bo Yang , Feng Zhang , Kun-Liang Lin , Jian-Gang Zhang
CPC分类号： B29C63/481 , B29C63/0004 , B29C63/0065 , B29C63/024 , B29C2063/0008 , B29C2063/483 , B29L2011/0016
摘要： A production line for producing components to a high standard of cleanliness and sealed and protected in that state includes a loading device, a cleaning device, a detecting device, a pasting device, a heat-sealing device, a packing device, and transfer devices of the production line. The production line automatically processes the components for obtaining components with the high cleanliness. By the processes of protective film pasting, heat-sealing, and packing, the components may be further protected from subsequent pollution. A method for producing components with a high cleanliness applied to the production line is also disclosed.
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