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公开(公告)号：US11883928B2
公开(公告)日：2024-01-30
申请号：US17322247
申请日：2021-05-17
发明人： Feng Zhang , Ming Luo , Ai-Jun Tang , Jian-Jun Meng
摘要： A mechanism for polishing includes a polishing member, an eccentric member coupled to the polishing member, and a driving member coupled to the eccentric member. The driving member drives the eccentric member to rotate to move the polishing member to reciprocate in the one-dimensional direction, so that when a relative position between the polishing mechanism and the workpiece is fixed, the polishing member polishes a workpiece by translating a polishing surface. A method for the polishing process, applied by a polishing device, is also disclosed. By using the polishing mechanism, the entirety of the polishable surface of the workpiece can be covered, and collapsed edges of the workpiece are avoided.
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