公开(公告)号：US08691481B2

公开(公告)日：2014-04-08

申请号：US13326603

申请日：2011-12-15

申请人： Fumihiko Ikeda ,  Hikaru Kubota ,  Koutarou Onoue

发明人： Fumihiko Ikeda ,  Hikaru Kubota ,  Koutarou Onoue

IPC分类号： G03F7/20

CPC分类号： G03F7/70425

摘要： A local exposure method includes steps of: dividing a large block into a plurality of small blocks; setting irradiation illuminances different in a stepwise fashion; controlling light emission of light emitting elements based on the irradiation illuminances respectively set for the small blocks for a photosensitive film on a substrate moving with respect to light emitting elements; developing the photosensitive film having been subjected to exposure processing by irradiation by the light emitting elements; measuring a residual film thickness of the photosensitive film for each of the small blocks to obtain correlation data between the illuminance set for the small block and the residual film thickness; and obtaining a required illuminance of irradiation to each of the large blocks from a target residual film thickness of the photosensitive film set for each of the large blocks based on the correlation data.

摘要翻译： 本地曝光方法包括以下步骤：将大块划分成多个小块; 以逐步的方式设置不同的照射照度; 基于相对于发光元件移动的基板上的感光膜的小块分别设定的照射照度，控制发光元件的发光; 通过发光元件的照射使经过曝光处理的感光膜显影; 测量每个小块的感光膜的残留膜厚度，以获得针对小块的照度设定和残留膜厚度之间的相关数据; 基于相关数据，从每个大块的感光膜组的目标残留膜厚度获得对每个大块的照射的要求照度。

公开(公告)号：US20120164585A1

公开(公告)日：2012-06-28

申请号：US13326603

申请日：2011-12-15

申请人： Fumihiko Ikeda ,  Hikaru Kubota ,  Koutarou Onoue

发明人： Fumihiko Ikeda ,  Hikaru Kubota ,  Koutarou Onoue

IPC分类号： G03F7/20 ,  G03B27/54

CPC分类号： G03F7/70425

摘要： A local exposure method includes steps of: dividing a large block into a plurality of small blocks; setting irradiation illuminances different in a stepwise fashion; controlling light emission of light emitting elements based on the irradiation illuminances respectively set for the small blocks for a photosensitive film on a substrate moving with respect to light emitting elements; developing the photosensitive film having been subjected to exposure processing by irradiation by the light emitting elements; measuring a residual film thickness of the photosensitive film for each of the small blocks to obtain correlation data between the illuminance set for the small block and the residual film thickness; and obtaining a required illuminance of irradiation to each of the large blocks from a target residual film thickness of the photosensitive film set for each of the large blocks based on the correlation data.

摘要翻译： 本地曝光方法包括以下步骤：将大块划分成多个小块; 以逐步的方式设置不同的照射照度; 基于相对于发光元件移动的基板上的感光膜的小块分别设定的照射照度，控制发光元件的发光; 通过发光元件的照射使经过曝光处理的感光膜显影; 测量每个小块的感光膜的残留膜厚度，以获得针对小块的照度设定和残留膜厚度之间的相关数据; 基于相关数据，从每个大块的感光膜组的目标残留膜厚度获得对每个大块的照射的要求照度。