公开(公告)号：US20120164585A1

公开(公告)日：2012-06-28

申请号：US13326603

申请日：2011-12-15

申请人： Fumihiko Ikeda ,  Hikaru Kubota ,  Koutarou Onoue

发明人： Fumihiko Ikeda ,  Hikaru Kubota ,  Koutarou Onoue

IPC分类号： G03F7/20 ,  G03B27/54

CPC分类号： G03F7/70425

摘要： A local exposure method includes steps of: dividing a large block into a plurality of small blocks; setting irradiation illuminances different in a stepwise fashion; controlling light emission of light emitting elements based on the irradiation illuminances respectively set for the small blocks for a photosensitive film on a substrate moving with respect to light emitting elements; developing the photosensitive film having been subjected to exposure processing by irradiation by the light emitting elements; measuring a residual film thickness of the photosensitive film for each of the small blocks to obtain correlation data between the illuminance set for the small block and the residual film thickness; and obtaining a required illuminance of irradiation to each of the large blocks from a target residual film thickness of the photosensitive film set for each of the large blocks based on the correlation data.

摘要翻译： 本地曝光方法包括以下步骤：将大块划分成多个小块; 以逐步的方式设置不同的照射照度; 基于相对于发光元件移动的基板上的感光膜的小块分别设定的照射照度，控制发光元件的发光; 通过发光元件的照射使经过曝光处理的感光膜显影; 测量每个小块的感光膜的残留膜厚度，以获得针对小块的照度设定和残留膜厚度之间的相关数据; 基于相关数据，从每个大块的感光膜组的目标残留膜厚度获得对每个大块的照射的要求照度。

公开(公告)号：US08307778B2

公开(公告)日：2012-11-13

申请号：US12375267

申请日：2007-07-05

申请人： Toshifumi Inamasu ,  Fumihiko Ikeda ,  Kenya Shinozaki ,  Yoshitaka Otsuka

发明人： Toshifumi Inamasu ,  Fumihiko Ikeda ,  Kenya Shinozaki ,  Yoshitaka Otsuka

IPC分类号： B05C5/02

CPC分类号： H01L21/6715

摘要： Jet lines C1, C3, C5, . . . extending in an X-direction and suction lines C2, C4, C6, . . . extending in the X-direction are arranged alternately at a fixed pitch W in a Y-direction. Jet openings 88 are arranged at fixed intervals 3D on the jet lines C2n−1, suction openings 90 are arranged at fixed intervals 3D on the suction lines C2n, and the jet openings 88 and the suction openings 90 on the adjacent ones of the jet lines C2n−1 and the suction lines C2n are spaced apart from each other by a fixed distance D with respect to the X-direction. Slots 88a and 90a are extended straight from the upper ends of the jet openings 88 and the upper ends of the suction openings 90, respectively, in a carrying direction (the X-direction) and a direction opposite the carrying direction.

摘要翻译： 喷射线C1，C3，C5，。 。 。 在X方向上延伸并且吸入线C2，C4，C6。 。 。 在X方向上延伸的方向以Y方向的固定间距W交替排列。 喷射开口88以喷射线C2n-1上的固定间隔3D布置，吸入口90以吸引线C2n上的固定间隔3D布置，并且喷射开口88和相邻喷射线上的吸入口90 C2n-1和吸引线C2n相对于X方向彼此间隔开固定距离D. 狭槽88a和90a分别沿着输送方向（X方向）和与输送方向相反的方向从喷射口88的上端和吸入口90的上端直线延伸。

公开(公告)号：US20090311434A1

公开(公告)日：2009-12-17

申请号：US12375267

申请日：2007-07-05

申请人： Toshifumi Inamasu ,  Fumihiko Ikeda ,  Kenya Shinozaki ,  Yoshitaka Otsuka

发明人： Toshifumi Inamasu ,  Fumihiko Ikeda ,  Kenya Shinozaki ,  Yoshitaka Otsuka

IPC分类号： B05D1/02 ,  B05C5/00

CPC分类号： H01L21/6715

摘要： Formation of banded irregularities in a process liquid film formed on a substrate being carried by a flotation carrying system is reduced or suppressed effectively.Jet lines C1, C3, C5, . . . extending in an X-direction and suction lines C2, C4, C6, . . . extending in the X-direction are arranged alternately at a fixed pitch W in a Y-direction. Jet openings 88 are arranged at fixed intervals 3D on the jet lines C2n−1, suction openings 90 are arranged at fixed intervals 3D on the suction lines C2n, and the jet openings 88 and the suction openings 90 on the adjacent ones of the jet lines C2n−1 and the suction lines C2n are spaced apart from each other by a fixed distance D with respect to the X-direction. Slots 88a and 90a are extended straight from the upper ends of the jet openings 88 and the upper ends of the suction openings 90, respectively, in a carrying direction (the X-direction) and a direction opposite the carrying direction.

摘要翻译： 通过浮选运载系统承载的在基板上形成的处理液膜中的带状凹凸的形成被有效地减少或抑制。 喷射线C1，C3，C5，。 。 。 在X方向上延伸并且吸入线C2，C4，C6。 。 。 在X方向上延伸的方向以Y方向的固定间距W交替排列。 喷射开口88以喷射线C2n-1上的固定间隔3D布置，吸入口90以吸引线C2n上的固定间隔3D布置，并且喷射开口88和相邻喷射线上的吸入口90 C2n-1和吸引线C2n相对于X方向彼此间隔开固定距离D. 狭槽88a和90a分别沿着输送方向（X方向）和与输送方向相反的方向从喷射口88的上端和吸入口90的上端直线延伸。

公开(公告)号：US08691481B2

公开(公告)日：2014-04-08

申请号：US13326603

申请日：2011-12-15

申请人： Fumihiko Ikeda ,  Hikaru Kubota ,  Koutarou Onoue

发明人： Fumihiko Ikeda ,  Hikaru Kubota ,  Koutarou Onoue

IPC分类号： G03F7/20

CPC分类号： G03F7/70425

摘要： A local exposure method includes steps of: dividing a large block into a plurality of small blocks; setting irradiation illuminances different in a stepwise fashion; controlling light emission of light emitting elements based on the irradiation illuminances respectively set for the small blocks for a photosensitive film on a substrate moving with respect to light emitting elements; developing the photosensitive film having been subjected to exposure processing by irradiation by the light emitting elements; measuring a residual film thickness of the photosensitive film for each of the small blocks to obtain correlation data between the illuminance set for the small block and the residual film thickness; and obtaining a required illuminance of irradiation to each of the large blocks from a target residual film thickness of the photosensitive film set for each of the large blocks based on the correlation data.

摘要翻译： 本地曝光方法包括以下步骤：将大块划分成多个小块; 以逐步的方式设置不同的照射照度; 基于相对于发光元件移动的基板上的感光膜的小块分别设定的照射照度，控制发光元件的发光; 通过发光元件的照射使经过曝光处理的感光膜显影; 测量每个小块的感光膜的残留膜厚度，以获得针对小块的照度设定和残留膜厚度之间的相关数据; 基于相关数据，从每个大块的感光膜组的目标残留膜厚度获得对每个大块的照射的要求照度。