公开(公告)号：US10831977B1

公开(公告)日：2020-11-10

申请号：US16429536

申请日：2019-06-03

Applicant: GLOBALFOUNDRIES INC.

Inventor： Mohamed Elsayed Mohamed Lotfy Gheith ,  Ian Stobert ,  Ayman Hamouda

IPC: G06F30/398 ,  G03F1/70 ,  G06N20/00 ,  G06F119/18

Abstract: The present disclosure generally relates to semiconductor structures and, more particularly, to curvilinear mask models and methods of manufacture. The method includes: calibrating, by a computing device, machine learning models for silicon photonics applications; retargeting, by the computing device, designs in a layout for the silicon photonics applications by applying the machine learning models to the designs; and repairing, by the computing device, unmatching shapes in the retargeted designs to generate final curvilinear mask shapes for the silicon photonics application.