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公开(公告)号:US10804170B2
公开(公告)日:2020-10-13
申请号:US16298309
申请日:2019-03-11
Applicant: GLOBALFOUNDRIES INC.
Inventor: Hongliang Shen , Guoxiang Ning , Erfeng Ding , Dongsuk Park , Xiaoxiao Zhang , Lan Yang
IPC: H01L21/66 , H01L27/02 , H01L27/088 , G06F30/20 , G06F30/398 , G06F111/04 , G06F111/20
Abstract: The present disclosure relates to a method which includes generating a device layout of an eBeam based overlay (EBO OVL) structure with a minimum design rule, simulating a worst case process margin for the generated device layout of the EBO OVL structure, enabling a plurality of devices for the simulated worst case process margin for the generated device layout of the EBO OVL structure, and breaking a plurality of design rules for the enabled plurality of devices of the EBO OVL structure to generate an OVL measurement layout of the EBO OVL structure.