公开(公告)号：US09250538B2

公开(公告)日：2016-02-02

申请号：US14146771

申请日：2014-01-03

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Guoxiang Ning ,  Christopher Spence ,  Paul Ackmann ,  Chin Teong Lim

IPC: G06F17/50 ,  G03F7/20 ,  G03F1/70

CPC classification number: G03F7/70441 ,  G03F1/70 ,  Y02T10/82

Abstract: A method and apparatus for an efficient optical proximity correction (OPC) repair flow is disclosed. Embodiments may include receiving an input data stream of an integrated circuit (IC) design layout, performing one or more iterations of an OPC step and a layout polishing step on the input data stream, and performing a smart enhancement step if an output of a last iteration of the OPC step fails to satisfy one or more layout criteria and if a number of the one or more iterations satisfies a threshold value. Additional embodiments may include performing a pattern insertion process cross-linked with the OPC step, the pattern insertion process being a base optical rule check (ORC) process.

Abstract translation: 公开了一种用于高效光学邻近校正（OPC）修复流程的方法和装置。 实施例可以包括接收集成电路（IC）设计布局的输入数据流，对输入数据流执行OPC步骤的一个或多个迭代和布局抛光步骤，以及如果最后一个输出的输出执行智能增强步骤 OPC步骤的迭代不能满足一个或多个布局标准，并且如果一个或多个迭代的数量满足阈值。 附加实施例可以包括执行与OPC步骤交联的模式插入过程，模式插入过程是基本光学规则检查（ORC）过程。