Fluid treatment system
    1.
    发明授权
    Fluid treatment system 有权
    流体处理系统

    公开(公告)号:US08679416B2

    公开(公告)日:2014-03-25

    申请号:US11840590

    申请日:2007-08-17

    IPC分类号: B01J19/08

    摘要: There is described a fluid treatment system. The fluid treatment system comprises: an open channel for receiving a flow of fluid and a fluid treatment zone. The fluid treatment zone comprising a plurality of elongate radiation source assemblies orientated such that: (i) a longitudinal axis of each radiation source assembly is transverse to a direction of fluid flow through the fluid treatment zone, and (ii) an end of each radiation source assembly is disposed above a predetermined maximum height of fluid flow in the open channel. A first baffle plate is disposed upstream of the fluid treatment zone. The first baffle plate is positioned such that a distal end thereof is below the predetermined maximum height of fluid flow in the open channel. In a preferred embodiment, the present fluid treatment system provides for an area in which a cleaning system for the radiation source assemblies can be “parked” when not in use. In the so-called “parked” position, the cleaning system may be readily accessed for servicing and the like without affecting the flow of fluid through the fluid treatment zone and a fluid treatment system. This is as significant advantage of the fluid treatment system.

    摘要翻译: 描述了一种流体处理系统。 流体处理系统包括:用于接收流体流的开放通道和流体处理区。 所述流体处理区包括多个细长的辐射源组件,其定向成:(i)每个辐射源组件的纵向轴线横向于通过流体处理区域的流体流动的方向,和(ii)每个辐射的末端 源组件设置在开放通道中的流体流的预定最大高度之上。 第一挡板设置在流体处理区的上游。 第一挡板被定位成使得其远端低于开放通道中流体流量的预定最大高度。 在优选实施例中,本流体处理系统提供了在不使用时用于辐射源组件的清洁系统可以“停放”的区域。 在所谓的“停放”位置,清洁系统可以容易地进行维修等,而不影响通过流体处理区和流体处理系统的流体的流动。 这是流体处理系统的显着优点。

    FLUID TREATMENT SYSTEM
    2.
    发明申请
    FLUID TREATMENT SYSTEM 有权
    流体处理系统

    公开(公告)号:US20080044320A1

    公开(公告)日:2008-02-21

    申请号:US11840590

    申请日:2007-08-17

    IPC分类号: B01J19/08

    摘要: There is described a fluid treatment system. The fluid treatment system comprises: an open channel for receiving a flow of fluid and a fluid treatment zone. The fluid treatment zone comprising a plurality of elongate radiation source assemblies orientated such that: (i) a longitudinal axis of each radiation source assembly is transverse to a direction of fluid flow through the fluid treatment zone, and (ii) an end of each radiation source assembly is disposed above a predetermined maximum height of fluid flow in the open channel. A first baffle plate is disposed upstream of the fluid treatment zone. The first baffle plate is positioned such that a distal end thereof is below the predetermined maximum height of fluid flow in the open channel. In a preferred embodiment, the present fluid treatment system provides for an area in which a cleaning system for the radiation source assemblies can be “parked” when not in use. In the so-called “parked” position, the cleaning system may be readily accessed for servicing and the like without affecting the flow of fluid through the fluid treatment zone and a fluid treatment system. This is as significant advantage of the fluid treatment system.

    摘要翻译: 描述了一种流体处理系统。 流体处理系统包括:用于接收流体流的开放通道和流体处理区。 所述流体处理区包括多个细长的辐射源组件,其定向成:(i)每个辐射源组件的纵向轴线横向于通过流体处理区域的流体流动的方向,和(ii)每个辐射的末端 源组件设置在开放通道中的流体流的预定最大高度之上。 第一挡板设置在流体处理区的上游。 第一挡板被定位成使得其远端低于开放通道中流体流量的预定最大高度。 在优选实施例中,本流体处理系统提供了在不使用时用于辐射源组件的清洁系统可以“停放”的区域。 在所谓的“停放”位置,清洁系统可以容易地进行维修等,而不影响通过流体处理区和流体处理系统的流体的流动。 这是流体处理系统的显着优点。

    RADIATION SOURCE ASSEMBLY AND FLUID TREATMENT SYSTEM
    3.
    发明申请
    RADIATION SOURCE ASSEMBLY AND FLUID TREATMENT SYSTEM 审中-公开
    辐射源组件和流体处理系统

    公开(公告)号:US20110006223A1

    公开(公告)日:2011-01-13

    申请号:US12808092

    申请日:2008-12-12

    IPC分类号: G21K5/00 G21K1/00

    摘要: There is disclosed a radiation source assembly comprising an elongate radiation emitting outer portion having non-circular cross-sectional shape and an elongate radiation source. A radiation source module and a fluid system incorporating the radiation source assembly are also disclosed. It has been discovered that the use of a non-circular shaped sleeve or outer lamp surface reduces the stress placed on these elements in a fluid treatment system in which the radiation source assemblies are disposed transverse (e.g., orthogonal) to the direction of fluid flow through the fluid treatment zone of the system.

    摘要翻译: 公开了一种辐射源组件,其包括具有非圆形横截面形状的细长辐射发射外部部分和细长辐射源。 还公开了一种辐射源模块和结合有辐射源组件的流体系统。 已经发现,使用非圆形套筒或外部灯表面减少了在流体处理系统中放置在这些元件上的应力,其中辐射源组件横向(例如,垂直于流体流动方向)设置 通过系统的流体处理区。