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公开(公告)号：US20240363326A1
公开(公告)日：2024-10-31
申请号：US18688346
申请日：2022-08-31
CPC分类号： H01J63/06 , H01J61/025 , H01J2893/0031
摘要： A cathode-ray ultraviolet light source comprising: an elongated glass envelope having a first end and second end, the glass envelope defining an evacuated volume; an electron gun positioned within the evacuated volume proximate to the first end and being capable of developing an electron beam; a target disposed within the evacuated volume between the first and second end of the glass envelope, the target comprising a phosphor material covered with a reflective metal film; and an electron beam focusing and deflecting mechanism disposed within the evacuated volume between the electron gun and the target to direct the electron beam towards the reflective metal film of the target.
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公开(公告)号：US12125695B2
公开(公告)日：2024-10-22
申请号：US17795775
申请日：2021-01-26
申请人： Cymer, LLC
IPC分类号： H01S3/036 , F16C19/06 , F16C35/04 , H01J61/02 , H01J61/16 , H01J61/30 , H01J61/52 , H01S3/225
CPC分类号： H01J61/30 , F16C19/06 , F16C35/04 , H01J61/025 , H01J61/16 , H01J61/52 , H01S3/036 , H01S3/225
摘要： A light source apparatus (100) includes: a chamber (101) having a chamber wall (103) defining an opening (107); and a support apparatus (110) including a support device (111) positioned within the opening of the chamber wall. The support device includes: a cup (112) having an inner surface (114) configured to retain a movable apparatus and an outer surface (116) having a first outer diameter; and a plurality of rods (118) arranged at the outer surface of the cup such that the arrangement of the plurality of rods defines a second outer diameter, the second outer diameter greater than the first outer diameter. The chamber wall is configured to hold the support device such that the chamber wall contacts the plurality of rods when the support device is positioned within the opening of the chamber wall, and the outer surface of the cup does not contact the chamber wall.
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3.发明公开公开(公告)号：US20230355821A1
公开(公告)日：2023-11-09
申请号：US18246241
申请日：2021-10-12
IPC分类号： A61L2/26 , B32B27/30 , B32B27/08 , B32B27/18 , A61L2/10 , G02B5/20 , G02B5/08 , G02B1/04 , H01J61/02
CPC分类号： A61L2/26 , B32B27/304 , B32B27/08 , B32B27/18 , A61L2/10 , G02B5/208 , G02B5/0891 , G02B1/04 , H01J61/025 , B32B2255/20 , B32B2255/28 , B32B2264/1022 , B32B2255/10 , B32B2551/00 , A61L2202/11
摘要： Multilayer articles are provided, including an absorbent layer and an ultraviolet mirror containing at least a plurality of alternating first and second optical layers. The absorbent layer absorbs ultraviolet light having a wavelength between at least 230 nanometers (nm) and 400 nm. The ultraviolet mirror reflects ultraviolet light in a wavelength range from 190 nm to 240 nm. Systems are also provided including a broadband UVC light source and a multilayer article. Devices are provided including a chamber, a broadband UVC light source located within the chamber, an absorbent layer in the chamber, and an ultraviolet mirror between the light source and absorbent layer. Methods of disinfecting a material are further provided, including obtaining a system or device, directing UVC light at the ultraviolet mirror, and exposing the material to ultraviolet light in a wavelength range from 190 nm to 240 nm, reflected by the ultraviolet mirror towards the material.
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公开(公告)号：US11764053B1
公开(公告)日：2023-09-19
申请号：US18046262
申请日：2022-10-13
申请人： mb-microtec ag
发明人： Karsten Richter , Philipp Michel , Remo Pfaff
CPC分类号： H01J61/302 , G21H3/02 , H01J61/025 , H01J61/12 , H01J65/00 , F41G1/345
摘要： A lighting element with a gaseous tritium light source and an elongated plastic housing that at least partially encloses the gaseous tritium light source with its housing shell and forms a latching element that snaps together with the gaseous tritium light source, which can be inserted into the plastic housing, and holds it in the plastic housing. A rugged lighting element can be produced if the latching element is formed by at least one catch element, which catch element has a radially sprung flexible spring and at least one, preferably two, inwardly oriented snaps with an indentation for snapping together with the gaseous tritium light source.
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公开(公告)号：US11694888B2
公开(公告)日：2023-07-04
申请号：US17785739
申请日：2020-12-15
发明人： Hideaki Yagyu
CPC分类号： H01J61/025 , H01J61/16
摘要： An ultraviolet irradiation device includes: a lamp house having at least one surface formed with a light extraction surface; an excimer lamp that is accommodated in the lamp house at a position apart from the light extraction surface in a first direction, the excimer lamp emitting ultraviolet light having a main emission wavelength belonging to a first wavelength band of 190 nm or more and 225 nm or less; a pair of electrodes that applies a voltage to a light-emitting tube of the excimer lamp; an optical filter that is disposed on the light extraction surface, and that substantially transmits the ultraviolet light having the first wavelength band and substantially fails to transmit ultraviolet light having a wavelength of 240 nm or more and 300 nm or less; and a light diffuser that is disposed between the excimer lamp and the optical filter in the lamp house in the first direction, for diffusing and reflecting light incident on the light diffuser.
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6.发明授权公开(公告)号：US09899205B2
公开(公告)日：2018-02-20
申请号：US15223335
申请日：2016-07-29
发明人： Ilya Bezel , Kenneth P. Gross , Lauren Wilson , Rahul Yadav , Joshua Wittenberg , Aizaz Bhuiyan , Anatoly Shchemelinin , Anant Chimmalgi , Richard Solarz
摘要： A system for forming a laser-sustained plasma includes a gas containment element, an illumination source configured to generate pump illumination, and a collector element configured to focus the pump illumination from the pumping source into the volume of the gas mixture in order to generate a plasma within the volume of the gas mixture that emits broadband radiation. The gas containment element may be configured to contain a volume of a gas mixture including a first gas component and a second gas component. The second gas component suppresses at least one of a portion of the broadband radiation associated with the first gas component or radiation by one or more excimers associated with the first gas component from a spectrum of radiation exiting the gas mixture.
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公开(公告)号：US09741553B2
公开(公告)日：2017-08-22
申请号：US14938353
申请日：2015-11-11
发明人： Rudi Blondia
IPC分类号： H01J61/02 , H01J65/04 , H01J61/16 , F21V7/00 , F21V3/00 , H01J61/24 , H01J61/30 , H01J61/33 , H01J61/35 , H01J61/54
CPC分类号： H01J61/025 , H01J61/16 , H01J61/24 , H01J61/30 , H01J61/33 , H01J61/35 , H01J61/54 , H01J65/04 , H01J65/042
摘要： The invention is directed to a sealed high intensity illumination device configured to receive a laser beam from a laser light source. A sealed chamber is configured to contain an ionizable medium. The chamber includes a reflective chamber interior surface having a first parabolic contour and parabolic focal region, a second parabolic contour and parabolic focal region, and an interface surface. An ingress surface is disposed within the interface surface configured to admit the laser beam into the chamber, and an egress surface disposed within the interface surface configured to emit high intensity light from the chamber. The first parabolic contour is configured to reflect light from the first parabolic focal region to the second parabolic contour, and the second parabolic contour is configured to reflect light from the first parabolic contour to the second parabolic focal region.
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公开(公告)号：US09723703B2
公开(公告)日：2017-08-01
申请号：US14675322
申请日：2015-03-31
CPC分类号： H05G2/003 , H01J61/025 , H01J61/302 , H01J65/042 , H05G2/001 , H05G2/008
摘要： A laser-sustained plasma light source for transverse plasma pumping includes a pump source configured to generate pumping illumination, one or more illumination optical elements and a gas containment structure configured to contain a volume of gas. The one or more illumination optical elements are configured to sustain a plasma within the volume of gas of the gas containment structure by directing pump illumination along a pump path to one or more focal spots within the volume of gas. The one or more collection optical elements are configured to collect broadband radiation emitted by the plasma along a collection path. Further, the illumination optical elements are configured to define the pump path such that pump illumination impinges the plasma along a direction transverse to a direction of propagation of the emitted broadband light of the collection path such that the pump illumination is substantially decoupled from the emitted broadband radiation.
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9.发明申请公开(公告)号：US20170150590A1
公开(公告)日：2017-05-25
申请号：US15280073
申请日：2016-09-29
发明人： Anant Chimmalgi , Rudolf Brunner , Anatoly Shchemelinin , Ilya Bezel , Erik Kim , Rajeev Patil
CPC分类号： H05G2/008 , G02B6/4204 , H01J61/025 , H01J61/54 , H01J65/04 , H01J65/042 , H05G2/003
摘要： An illumination source for igniting and sustaining a plasma in a plasma lamp of a laser-sustained plasma (LSP) broadband source includes one or more ignition lasers configured to ignite the plasma within a gas contained within the plasma lamp. The illumination sources also includes one or more sustaining lasers configured to sustain the plasma. The illumination sources includes a delivery optical fiber one or more optical elements configured to selectively optically couple an output of the one or more ignition lasers and an output of the one or more sustaining lasers to the delivery optical fiber.
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公开(公告)号：US20170135192A1
公开(公告)日：2017-05-11
申请号：US15409702
申请日：2017-01-19
发明人： Rudi Blondia
IPC分类号： H05H1/46
CPC分类号： H05H1/46 , G03F7/70008 , G03F7/70016 , G03F7/70025 , G03F7/70033 , G03F7/7005 , H01J61/025 , H01J61/16 , H01J61/30 , H01J61/54 , H01J65/04
摘要： An ignition facilitated electrodeless sealed high intensity illumination device is configured to receive a laser beam from a continuous wave (CW) laser light source. A sealed chamber is configured to contain an ionizable medium. The chamber has an ingress window disposed within a wall of a chamber interior surface configured to admit the laser beam into the chamber, a plasma sustaining region, and a high intensity light egress window configured to emit high intensity light from the chamber. The CW laser beam is producible by a CW laser below 250 Watts configured to produce a wavelength below 1100 nm. The device is configured to focus the laser beam to a full width at half maximum (FWHM) beam waist of 1-15 microns2 and a Rayleigh length of 6 microns or less, and the plasma is configured to be ignited by the CW laser beam.
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