Electrical resistance device for radiation detection

    公开(公告)号:US11782174B2

    公开(公告)日:2023-10-10

    申请号:US17625206

    申请日:2020-07-10

    IPC分类号: G01T1/26 G01T3/00

    CPC分类号: G01T1/26 G01T3/00

    摘要: A radiation detector (100) includes an insulating substrate (110), which includes a material that undergoes a change in an electrical property when subjected to ionizing radiation. A conductive film (112) is disposed in relation to a surface of the substrate. The conductive film (112) has a resistance that is a function of a state of the electrical property. A resistance measuring device measures resistance across the conductive film (112). The resistance measured by the resistance measuring device indicates an amount of ionizing radiation to which the substrate (110) has been subjected. In a method of determining exposure to a type of radiation, a boron nitride substrate is exposed to a radiation environment. A resistance is measured across a conductive film disposed in relation to the boron nitride substrate. Radiation exposure is calculated as a function of the resistance.

    Electrical resistance device for radiation detection

    公开(公告)号:US20220365233A1

    公开(公告)日:2022-11-17

    申请号:US17625206

    申请日:2020-07-10

    IPC分类号: G01T1/26 G01T3/00

    摘要: A radiation detector (100) includes an insulating substrate (110), which includes a material that undergoes a change in an electrical property when subjected to ionizing radiation. A conductive film (112) is disposed in relation to a surface of the substrate. The conductive film (112) has a resistance that is a function of a state of the electrical property. A resistance measuring device measures resistance across the conductive film (112). The resistance measured by the resistance measuring device indicates an amount of ionizing radiation to which the substrate (110) has been subjected. In a method of determining exposure to a type of radiation, a boron nitride substrate is exposed to a radiation environment. A resistance is measured across a conductive film disposed in relation to the boron nitride substrate. Radiation exposure is calculated as a function of the resistance.