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公开(公告)号:US07098456B1
公开(公告)日:2006-08-29
申请号:US10918088
申请日:2004-08-13
申请人: Gian Francesco Lorusso , Paola De Cecco , Luca Grella , David L. Adler , David Goodstein , Chris Bevis
发明人: Gian Francesco Lorusso , Paola De Cecco , Luca Grella , David L. Adler , David Goodstein , Chris Bevis
IPC分类号: H01J37/28 , G01N23/225
CPC分类号: G01N23/2251 , H01J37/265 , H01J37/28 , H01J2237/2817 , H01J2237/2826
摘要: One embodiment disclosed relates to a method for accurate electron beam metrology. A substrate with a target feature is loaded into a scanning electron microscope. An electron beam is scanned over the target feature, and scattered electrons are detected therefrom. A characteristic of the target feature is measured by finding optimal values for parameters of a mathematical model which accounts for substrate charging effects. Principal component analysis may be used to advantageously result in reduced requirements for processing time and/or computational speed.
摘要翻译: 所公开的一个实施例涉及一种精确电子束计量的方法。 将具有目标特征的基板装载到扫描电子显微镜中。 在目标特征上扫描电子束,并从中检测散射的电子。 通过找到考虑到基板充电效应的数学模型的参数的最佳值来测量目标特征的特征。 主成分分析可用于有利地减少对处理时间和/或计算速度的要求。