公开(公告)号：US20230349762A1

公开(公告)日：2023-11-02

申请号：US18351712

申请日：2023-07-13

Applicant: Gigaphoton Inc.

Inventor： Natsuhiko KOUNO ,  Shunya OIWA ,  Masato MORIYA

IPC: G01J3/44 ,  H01S3/082 ,  H01S3/106 ,  B23K26/70

CPC classification number: G01J3/4406 ,  H01S3/0826 ,  H01S3/1067 ,  B23K26/705 ,  G01J2009/0238

Abstract: A laser system connectable to an exposure apparatus includes a spectrometer configured to acquire a measurement waveform from an interference pattern of laser light output from the laser system, and a processor configured to calculate a convolution spectrum waveform using the measurement waveform and a first intermediate function obtained through a process of deconvolution of an aerial image function of the exposure apparatus with an instrument function of the spectrometer.