公开(公告)号：US09955563B2

公开(公告)日：2018-04-24

申请号：US14636413

申请日：2015-03-03

Applicant: Carl Zeiss SMT GmbH

Inventor： Ingo Saenger ,  Manfred Maul ,  Christoph Hennerkes ,  Johannes Ruoff ,  Daniel Kraehmer

IPC: G03B27/72 ,  H05G2/00 ,  G02B27/28 ,  G03F7/20 ,  G21K1/06 ,  G21K1/16 ,  H01J35/00 ,  H05H7/04

CPC classification number: H05G2/001 ,  G02B27/286 ,  G03F7/70033 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70308 ,  G03F7/70566 ,  G21K1/06 ,  G21K1/062 ,  G21K1/16 ,  H01J35/00 ,  H05H7/04

Abstract: An EUV light source serves for generating a usable output beam of EUV illumination light for a projection exposure apparatus for projection lithography. The light source has an EUV generation device which generates an EUV raw output beam. The latter is circularly polarized. For the purposes of setting the polarization of the usable output beam and in respect of the polarization direction, a polarization setting device has a linearly polarizing effect on the raw output beam. This results in an EUV light source, which provides an improved output beam for a resolution-optimized illumination.

公开(公告)号：US09857690B2

公开(公告)日：2018-01-02

申请号：US15182926

申请日：2016-06-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hoyeon Kim ,  Jinseok Heo ,  Insung Kim

IPC: G03B27/54 ,  G03F7/20 ,  H05G2/00 ,  G02B19/00

CPC classification number: G03F7/70033 ,  G02B19/0095 ,  G03F7/70916 ,  H05G2/001

Abstract: An extreme ultraviolet generation device, including a chamber with an internal space; a plasma generator to generate plasma in the internal space; a condenser in the internal space to gather light generated from the plasma; and a monitor to monitor the internal space in an omnidirectional manner.

公开(公告)号：US20170307978A1

公开(公告)日：2017-10-26

申请号：US15508543

申请日：2015-08-11

Applicant: ASML Netherlands B.V.

Inventor： Erik Willem BOGAART ,  Chuangxin ZHAO

IPC: G03F7/20 ,  H05G2/00 ,  G01N27/22

CPC classification number: G03F7/20 ,  G01N27/22 ,  G01N2027/222 ,  G03F7/70033 ,  G03F7/7085 ,  G03F7/70908 ,  H05G2/001

Abstract: Capacitive measurements for monitoring vapor or deposits from a vapor in a radiation source for a lithography apparatus. The measurements may be used to control operation of the radiation source. In one particular arrangement measurements from a plurality of capacitors are used to distinguish between changes in capacitance caused by the vapor and changes in capacitance caused by deposits from the vapor.

公开(公告)号：US20170218440A1

公开(公告)日：2017-08-03

申请号：US15422436

申请日：2017-02-01

Applicant: Supriya JAISWAL

Inventor： Supriya JAISWAL

IPC: C12Q1/68 ,  G01N21/59 ,  G01N23/083 ,  C12N15/10 ,  G01N33/68

CPC classification number: C12Q1/6869 ,  C12N15/102 ,  G01N21/33 ,  G01N21/59 ,  G01N23/083 ,  G01N33/6818 ,  G01N33/6893 ,  G01N2021/335 ,  G01N2223/612 ,  H05G2/001

Abstract: Methods, apparatus, and processes which use Extreme ultraviolet radiation (EUV) and/or soft X-ray wavelengths to read, image, edit, locate, identify, map, alter, delete, repair and sequence genes are described. An EUV scanning tool which allows high throughput genomic scanning of DNA, RNA and protein sequences is also described. A database which records characteristic absorption spectra of gene sequences is also described.

公开(公告)号：US09723703B2

公开(公告)日：2017-08-01

申请号：US14675322

申请日：2015-03-31

Applicant: KLA-Tencor Corporation

Inventor： Ilya Bezel ,  Anatoly Shchemelinin ,  Richard Solarz ,  Sebaek Oh ,  Matthew Derstine

IPC: H05G2/00 ,  H01J61/02 ,  H01J61/30 ,  H01J65/04

CPC classification number: H05G2/003 ,  H01J61/025 ,  H01J61/302 ,  H01J65/042 ,  H05G2/001 ,  H05G2/008

Abstract: A laser-sustained plasma light source for transverse plasma pumping includes a pump source configured to generate pumping illumination, one or more illumination optical elements and a gas containment structure configured to contain a volume of gas. The one or more illumination optical elements are configured to sustain a plasma within the volume of gas of the gas containment structure by directing pump illumination along a pump path to one or more focal spots within the volume of gas. The one or more collection optical elements are configured to collect broadband radiation emitted by the plasma along a collection path. Further, the illumination optical elements are configured to define the pump path such that pump illumination impinges the plasma along a direction transverse to a direction of propagation of the emitted broadband light of the collection path such that the pump illumination is substantially decoupled from the emitted broadband radiation.

公开(公告)号：US20170146466A1

公开(公告)日：2017-05-25

申请号：US15370280

申请日：2016-12-06

Applicant: The Johns Hopkins University

Inventor： Daniel Stutman ,  Michael Finkenthal

IPC: G01N23/04 ,  G01N23/20 ,  G21K1/06 ,  G01N23/087

CPC classification number: G01N23/04 ,  A61B6/40 ,  A61B6/4035 ,  A61B6/4042 ,  A61B6/4241 ,  A61B6/4291 ,  A61B6/482 ,  A61B6/483 ,  A61B6/484 ,  A61B6/505 ,  A61B6/5235 ,  A61B6/583 ,  G01N23/087 ,  G01N23/20075 ,  G01N2223/206 ,  G21K1/067 ,  G21K2207/005 ,  H05G2/001

Abstract: A differential phase contrast X-ray imaging system includes an X-ray illumination system, a beam splitter arranged in an optical path of the X-ray illumination system, and a detection system arranged in an optical path to detect X-rays after passing through the beam splitter.

公开(公告)号：US09625824B2

公开(公告)日：2017-04-18

申请号：US14803849

申请日：2015-07-20

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Yen-Cheng Lu ,  Jeng-Horng Chen ,  Shun-Der Wu ,  Tzu-Hsiang Chen

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70025 ,  G03F7/70033 ,  G03F7/7055 ,  G03F7/70983 ,  H05G2/00 ,  H05G2/001 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An extreme ultraviolet (EUV) radiation source module includes a target droplet generator, a first laser source, and a second laser source. The target droplet generator is configured to generate a plurality of target droplets. The first laser source is configured to generate a plurality of first laser pulses that heat the target droplets at respective excitation positions thereby generating a plurality of target plumes. At least one of the target droplets is heated at an excitation position different from that of other target droplets. The second laser source is configured to generate a plurality of second laser pulses that heat the target plumes thereby generating plasma emitting EUV radiation.

公开(公告)号：US09599812B2

公开(公告)日：2017-03-21

申请号：US14915845

申请日：2014-09-05

Applicant: USHIO DENKI KABUSHIKI KAISHA

Inventor： Christof Metzmacher ,  Hermann Giese ,  Achim Weber ,  Hironobu Yabuta ,  Rolf Theo Anton Apetz ,  Tatsushi Igarashi ,  Hiroto Sato ,  Noritaka Ashizawa

IPC: H05G2/00 ,  G02B27/00 ,  G03F7/20 ,  H05H1/48 ,  H05H1/44

CPC classification number: G02B27/0006 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/001 ,  H05G2/008 ,  H05H1/44 ,  H05H1/48

Abstract: Disclosed herein a rotational type foil trap that is capable of avoiding the transmission rate of the EUV light to be lowered even when the EUV light source operates with the high input power and also suppressing the temperature increase of the foil to attain a sufficient life duration. In the rotational type foil trap, one end of each of foils is inserted into each of a plurality of grooves provided on a side face of a center support, and the center support and the each of the foils are fixed together by brazing.

公开(公告)号：US20170059998A1

公开(公告)日：2017-03-02

申请号：US15182926

申请日：2016-06-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hoyeon KIM ,  Jinseok HEO ,  Insung KIM

IPC: G03F7/20 ,  G02B19/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G02B19/0095 ,  G03F7/70916 ,  H05G2/001

Abstract: An extreme ultraviolet generation device, including a chamber with an internal space; a plasma generator to generate plasma in the internal space; a condenser in the internal space to gather light generated from the plasma; and a monitor to monitor the internal space in an omnidirectional manner.

Abstract translation: 一种极紫外线发生装置，包括具有内部空间的腔室; 等离子体发生器，用于在内部空间中产生等离子体; 内部空间的冷凝器收集从等离子体产生的光; 以及监视器以全向方式监视内部空间。

公开(公告)号：US20160302295A1

公开(公告)日：2016-10-13

申请号：US14212787

申请日：2014-03-14

Applicant: Board of Regents of the University of Nebraska-Lincoln

Inventor： Donald Umstadter

IPC: H05G2/00 ,  G21F1/02

CPC classification number: H05G2/008 ,  H05G2/00 ,  H05G2/001 ,  H05G2/003

Abstract: A method for temporally and spatially aligning a laser-based x-ray source and maintaining alignment is disclosed. A pump laser beam, which interacts with a plasma source to create an electron beam, is aligned with the electron beam. A scattering laser beam is overlapped with the pump laser beam at an intersection point. The pump laser beam and scattering laser beam alignments are monitored and adjusted to maintain optimal alignment during operation of the laser-based x-ray source.

Abstract translation: 公开了一种用于时间和空间上对准基于激光的x射线源并保持对准的方法。 与等离子体源相互作用以产生电子束的泵浦激光束与电子束对准。 散射激光束在交点处与泵浦激光束重叠。 监测和调整泵激光束和散射激光束对准以在基于激光的x射线源的操作期间保持最佳对准。