-
公开(公告)号:US11939323B2
公开(公告)日:2024-03-26
申请号:US17744525
申请日:2022-05-13
发明人: Xiang Wang , Shinji Fujimori , Todd Daniel Nelson , Ana Cristina Parra Rivera , Devon Mundal , Benjamin Graetz , Morin M. Frick
IPC分类号: C07D413/06
CPC分类号: C07D413/06
摘要: The present disclosure relates to processes for preparing a compound of formula I:
The disclosure also provides compounds that are synthetic intermediates.-
公开(公告)号:US20220388996A1
公开(公告)日:2022-12-08
申请号:US17744525
申请日:2022-05-13
发明人: Xiang Wang , Shinji Fujimori , Todd Daniel Nelson , Ana Cristina Parra Rivera , Devon Mundal , Benjamin Graetz , Morin M. Frick
IPC分类号: C07D413/06
摘要: The present disclosure relates to processes for preparing a compound of formula I: The disclosure also provides compounds that are synthetic intermediates.
-