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1.
公开(公告)号:US20230174504A1
公开(公告)日:2023-06-08
申请号:US18102440
申请日:2023-01-27
发明人: Fang Wang , Youqian Deng , Morin Mae Frick , Xiang Wang
IPC分类号: C07D401/04
CPC分类号: C07D401/04 , C07B2200/13
摘要: The present disclosure relates to processes for preparing a compound of Formula (I)
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公开(公告)号:US20220144800A1
公开(公告)日:2022-05-12
申请号:US17520453
申请日:2021-11-05
发明人: Fang Wang , Youqian Deng , Morin Mae Frick , Xiang Wang
IPC分类号: C07D401/04
摘要: The present disclosure relates to processes for preparing a compound of Formula (I)
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公开(公告)号:US20220324833A1
公开(公告)日:2022-10-13
申请号:US17843283
申请日:2022-06-17
发明人: Fang Wang , Youqian Deng , Morin Mae Frick , Xiang Wang
IPC分类号: C07D401/04
摘要: The present disclosure relates to processes for preparing a compound of Formula (I)
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公开(公告)号:US11939323B2
公开(公告)日:2024-03-26
申请号:US17744525
申请日:2022-05-13
发明人: Xiang Wang , Shinji Fujimori , Todd Daniel Nelson , Ana Cristina Parra Rivera , Devon Mundal , Benjamin Graetz , Morin M. Frick
IPC分类号: C07D413/06
CPC分类号: C07D413/06
摘要: The present disclosure relates to processes for preparing a compound of formula I:
The disclosure also provides compounds that are synthetic intermediates.-
公开(公告)号:US20220388996A1
公开(公告)日:2022-12-08
申请号:US17744525
申请日:2022-05-13
发明人: Xiang Wang , Shinji Fujimori , Todd Daniel Nelson , Ana Cristina Parra Rivera , Devon Mundal , Benjamin Graetz , Morin M. Frick
IPC分类号: C07D413/06
摘要: The present disclosure relates to processes for preparing a compound of formula I: The disclosure also provides compounds that are synthetic intermediates.
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