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公开(公告)号：US20230398502A1
公开(公告)日：2023-12-14
申请号：US18452813
申请日：2023-08-21
CPC分类号： B01D69/02 , B01D71/64 , B01D67/0034 , G03F7/0015 , B01D2325/021 , B01D2323/24 , B01D2323/42
摘要： Porous liquid-filtering membranes having a repeatable distribution of pores of a small dimension are provided, as well as pillar templates that are used to produce such liquid filtering membranes. Also disclosed are methods of making and using the pillar templates to make porous liquid filtering membranes.
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公开(公告)号：US20210308634A1
公开(公告)日：2021-10-07
申请号：US16842402
申请日：2020-04-07
摘要： Porous membranes are provided according to the invention having desirable coefficient of thermal expansion and large surface area, for example at least about 4,000 mm2. These porous membranes may be made according to an exemplary process employing lithographic patterning of a photoresist followed by development of the photoresist and etching. In one aspect, the etch barrier layer is chosen from a material that does not react with or incorporate metal or other contaminants into the membrane layer.
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公开(公告)号：US20220379271A1
公开(公告)日：2022-12-01
申请号：US17883692
申请日：2022-08-09
摘要： Porous membranes are provided according to the invention having desirable coefficient of thermal expansion and large surface area, for example at least about 4,000 mm2. These porous membranes may be made according to an exemplary process employing lithographic patterning of a photoresist followed by development of the photoresist and etching. In one aspect, the etch barrier layer is chosen from a material that does not react with or incorporate metal or other contaminants into the membrane layer.
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公开(公告)号：US20210308628A1
公开(公告)日：2021-10-07
申请号：US16842448
申请日：2020-04-07
摘要： Porous membranes are provided according to the invention having desirable coefficient of thermal expansion and large surface area, for example at least about 4,000 mm2. These porous membranes may be made according to an exemplary process employing lithographic patterning of a photoresist followed by development of the photoresist and etching. In one aspect, the etch barrier layer is chosen from a material that does not react with or incorporate metal or other contaminants into the membrane layer.
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