X-ray system, X-ray apparatus, X-ray target, and methods for manufacturing same
    1.
    发明授权
    X-ray system, X-ray apparatus, X-ray target, and methods for manufacturing same 有权
    X射线系统,X射线装置,X射线靶及其制造方法

    公开(公告)号:US07522707B2

    公开(公告)日:2009-04-21

    申请号:US11555729

    申请日:2006-11-02

    IPC分类号: H01J35/10

    摘要: In some embodiments, an X-ray target includes a target cap formed of a substrate material and a focal track layer of emitting material, and at least one of the substrate material and the emitting material has a density greater than about 95.0% of theoretical density. In some embodiments, a method of manufacturing an X-ray target includes forming an intermediate target cap form of substrate material and a focal track layer of emitting material, and compacting the intermediate target cap form by application of gas pressure at elevated temperature to form a final target cap form, and at least the substrate material is dense substrate material having a final density greater than an intermediate density or the emitting material is dense emitting material having a final emitting material density greater than an intermediate emitting material density.

    摘要翻译: 在一些实施例中,X射线靶包括由衬底材料形成的靶帽和发射材料的焦点轨迹层,并且衬底材料和发射材料中的至少一个具有大于理论密度的约95.0%的密度 。 在一些实施例中,制造X射线靶的方法包括形成衬底材料的中间目标帽形式和发射材料的焦点轨迹层,并通过在升高的温度下施加气体压力来压制中间靶帽形式,以形成 最终目标帽形式,并且至少衬底材料是具有大于中间密度的最终密度的致密衬底材料,或者发光材料是具有大于中间发光材料密度的最终发射材料密度的致密发射材料。

    X-RAY SYSTEM, X-RAY APPARATUS, X-RAY TARGET, AND METHODS FOR MANUFACTURING SAME
    2.
    发明申请
    X-RAY SYSTEM, X-RAY APPARATUS, X-RAY TARGET, AND METHODS FOR MANUFACTURING SAME 有权
    X射线系统,X射线装置,X射线目标及其制造方法

    公开(公告)号:US20080107238A1

    公开(公告)日:2008-05-08

    申请号:US11555729

    申请日:2006-11-02

    IPC分类号: H01J35/10 B22F3/24 B22F3/12

    摘要: In some embodiments, an X-ray target includes a target cap formed of a substrate material and a focal track layer of emitting material, and at least one of the substrate material and the emitting material has a density greater than about 95.0% of theoretical density. In some embodiments, a method of manufacturing an X-ray target includes forming an intermediate target cap form of substrate material and a focal track layer of emitting material, and compacting the intermediate target cap form by application of gas pressure at elevated temperature to form a final target cap form, and at least the substrate material is dense substrate material having a final density greater than an intermediate density or the emitting material is dense emitting material having a final emitting material density greater than an intermediate emitting material density.

    摘要翻译: 在一些实施例中,X射线靶包括由衬底材料形成的靶帽和发射材料的焦点轨迹层,并且衬底材料和发射材料中的至少一个具有大于理论密度的约95.0%的密度 。 在一些实施例中,制造X射线靶的方法包括形成衬底材料的中间目标帽形式和发射材料的焦点轨迹层,并通过在升高的温度下施加气体压力来压制中间靶帽形状,以形成 最终目标帽形式,并且至少衬底材料是具有大于中间密度的最终密度的致密衬底材料,或者发光材料是具有大于中间发光材料密度的最终发射材料密度的致密发射材料。