公开(公告)号：US20200088514A1

公开(公告)日：2020-03-19

申请号：US16613996

申请日：2017-11-22

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Kiyotada HOSOKAWA ,  Shigeru EURA

IPC: G01B11/26

Abstract: An orientation characteristic measurement system (1) includes an irradiation optical system (5), a detection optical system (11), a light detector (13), a rotation mechanism (9) changing an angle (4) between a surface of the sample and an optical axis (L2) of the detection optical system (11), and a computer (15), and the computer (15) includes a rotation mechanism control unit (32) controlling the rotation mechanism (9), a distribution acquisition unit (34) normalizing an angle-dependent distribution of light intensity to acquire an angle-dependent distribution of light intensity, an area specifying unit (35) specifying light intensity in a maximum area on the basis of the angle-dependent distribution of the light intensity, and a parameter calculation unit (36) calculating the orientation parameter (S) on the basis of a linear relationship determined using the film thickness and refractive index of the sample and the light intensity in the maximum area.

公开(公告)号：US20220057197A1

公开(公告)日：2022-02-24

申请号：US17517049

申请日：2021-11-02

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Kiyotada HOSOKAWA ,  Shigeru EURA

IPC: G01B11/26

Abstract: An orientation characteristic measurement system (1) includes an irradiation optical system (5), a detection optical system (11), a light detector (13), a rotation mechanism (9) changing an angle (ϕ) between a surface of the sample and an optical axis (L2) of the detection optical system (11), and a computer (15), and the computer (15) includes a rotation mechanism control unit (32) controlling the rotation mechanism (9), a distribution acquisition unit (34) normalizing an angle-dependent distribution of light intensity to acquire an angle-dependent distribution of light intensity, an area specifying unit (35) specifying light intensity in a maximum area on the basis of the angle-dependent distribution of the light intensity, and a parameter calculation unit (36) calculating the orientation parameter (S) on the basis of a linear relationship determined using the film thickness and refractive index of the sample and the light intensity in the maximum area.