公开(公告)号：US20240418575A1

公开(公告)日：2024-12-19

申请号：US18706789

申请日：2022-07-15

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Kazuki KAWAI ,  Satoru KOBAYASHI ,  Yoshinori KATO ,  Takashi SEKINE ,  Takaaki MORITA ,  Yuki IKEYA ,  Takuto IGUCHI

IPC: G01J9/00

Abstract: A wavefront measurement device includes: a phase modulation unit having a spatial light modulator on which incident light is incident; a pattern generation unit configured to generate a phase pattern to be inputted to the spatial light modulator; an imaging unit having an imaging region for imaging an image of a portion of the incident light modulated by the spatial light modulator as measurement light; and an analysis unit configured to analyze a wavefront of the incident light based on an imaging result by the imaging unit, in which the pattern generation unit generates a plurality of phase patterns for which a measurement virtual pattern is shifted to positions different from each other such that a focused spot of the measurement light modulated by the spatial light modulator shifts over time to different positions in the imaging region.