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公开(公告)号：US09824702B2
公开(公告)日：2017-11-21
申请号：US15617677
申请日：2017-06-08
发明人： Yoshitaka Sasaki , Hiroyuki Ito , Kazuki Sato , Yukinori Ikegawa , Shigeki Tanemura , Kenichi Takano
CPC分类号： G11B5/17 , G11B5/1278 , G11B5/3123
摘要： A magnetic head includes a coil, a main pole and a return path section. The return path section is located on the trailing side relative to the main pole so that a space is defined between the main pole and itself. The coil includes a first winding portion and a second winding portion connected in series. The first winding portion extends to pass through the aforementioned space, and extends once around the entire perimeter of the main pole as viewed from the medium facing surface. The second winding portion does not pass through the aforementioned space, and surrounds only a part of the entire perimeter of the main pole as viewed from the medium facing surface.
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公开(公告)号：US09412397B1
公开(公告)日：2016-08-09
申请号：US14608586
申请日：2015-01-29
发明人： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Seiichiro Tomita , Kazuki Sato , Hideo Mamiya
CPC分类号： G11B5/3123 , G11B5/17 , G11B5/3906 , G11B2005/0021
摘要： A magnetic write head has a plated coil with narrow pitch and is suitable for writing at high frequencies on magnetic media with high coercivity. The narrow pitch is obtained without such disadvantages as overplating that has adversely affected prior art attempts to produce such narrow pitches. The process that produces the magnetic write head is characterized by an RIE plasma etch using O2/N2 to etch plating trenches into a baked layer of photoresist with the ratio of gases being 5/45 sccm so that a dilute O2 concentration does not create unwanted side etching of the plating trenches. In addition, a Cu seed layer is coated with an insulating layer of Al2O3 which redeposits on the trench sidewalls to inhibit redeposition of any Cu from the seed layer and prevent outward growth of the plated Cu that would result in overplating.
摘要翻译： 磁写头具有窄间距的电镀线圈，适用于高矫顽磁性介质的高频写入。 获得窄的间距没有诸如对现有技术尝试产生这种窄间距产生不利影响的过度镀敷的缺点。 产生磁写头的过程的特征在于使用O 2 / N 2的RIE等离子体蚀刻将电镀沟槽蚀刻成光致抗蚀剂的烘烤层，其中气体比例为5/45sccm，使得稀的O 2浓度不会产生不期望的侧面 蚀刻电镀槽。 此外，Cu籽晶层涂覆有Al 2 O 3的绝缘层，其重新沉积在沟槽侧壁上以抑制任何Cu从种子层的再沉积，并防止导致过镀的镀覆Cu的向外生长。
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公开(公告)号：US09013964B2
公开(公告)日：2015-04-21
申请号：US14021365
申请日：2013-09-09
发明人： Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Kazuki Sato , Hironori Araki , Ryuji Fujii
CPC分类号： G11B13/08 , G11B5/314 , G11B5/6088 , G11B2005/0021
摘要： A return path section includes first and second yoke portions and first, second and third columnar portions. The first and second yoke portions and the first columnar portion are located on the same side in the direction of travel of the recording medium relative to a wave guide core. The second and third columnar portions are located on opposite sides of a plasmon generator and connected to a shield. The first yoke portion connects a main pole to the first columnar portion. The second yoke portion connects the first columnar portion to the second and third columnar portions. A coil is wound around the first columnar portion.
摘要翻译： 返回路径部分包括第一和第二轭部分以及第一，第二和第三柱状部分。 第一和第二磁轭部分和第一柱状部分位于记录介质相对于波导芯的行进方向的同一侧。 第二和第三柱状部分位于等离子体发生器的相对侧并且连接到屏蔽。 第一轭部将主极连接到第一柱状部。 第二轭部将第一柱状部分连接到第二和第三柱状部分。 线圈缠绕在第一柱状部分上。
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公开(公告)号：US20170011756A1
公开(公告)日：2017-01-12
申请号：US15222431
申请日：2016-07-28
发明人： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Seiichiro Tomita , Kazuki Sato , Hideo Mamiya
CPC分类号： G11B5/3123 , G11B5/17 , G11B5/3906 , G11B2005/0021
摘要： A magnetic write head has a plated coil with narrow pitch and is suitable for writing at high frequencies on magnetic media with high coercivity. The narrow pitch is obtained without such disadvantages as overplating that has adversely affected prior art attempts to produce such narrow pitches. The process that produces the magnetic write head is characterized by an RIE plasma etch using O2/N2 to etch plating trenches into a baked layer of photoresist with the ratio of gases being 5/45 sccm so that a dilute O2 concentration does not create unwanted side etching of the plating trenches. In addition, a Cu seed layer is coated with an insulating layer of Al2O3 which redeposits on the trench sidewalls to inhibit redeposition of any Cu from the seed layer and prevent outward growth of the plated Cu that would result in overplating.
摘要翻译： 磁写头具有窄间距的电镀线圈，适用于高矫顽磁性介质的高频写入。 获得窄的间距没有诸如对现有技术尝试产生这种窄间距产生不利影响的过度镀敷的缺点。 产生磁写头的过程的特征在于使用O 2 / N 2的RIE等离子体蚀刻将电镀沟槽蚀刻成光致抗蚀剂的烘烤层，其中气体比例为5/45sccm，使得稀的O 2浓度不会产生不期望的侧面 蚀刻电镀槽。 此外，Cu籽晶层涂覆有Al 2 O 3的绝缘层，其重新沉积在沟槽侧壁上以抑制任何Cu从种子层的再沉积，并防止导致过镀的镀覆Cu的向外生长。
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公开(公告)号：US20160225391A1
公开(公告)日：2016-08-04
申请号：US14608586
申请日：2015-01-29
发明人： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Seiichiro Tomita , Kazuki Sato , Hideo Mamiya
CPC分类号： G11B5/3123 , G11B5/17 , G11B5/3906 , G11B2005/0021
摘要： A magnetic write head has a plated coil with narrow pitch and is suitable for writing at high frequencies on magnetic media with high coercivity. The narrow pitch is obtained without such disadvantages as overplating that has adversely affected prior art attempts to produce such narrow pitches. The process that produces the magnetic write head is characterized by an RIE plasma etch using O2/N2 to etch plating trenches into a baked layer of photoresist with the ratio of gases being 5/45 sccm so that a dilute O2 concentration does not create unwanted side etching of the plating trenches. In addition, a Cu seed layer is coated with an insulating layer of Al2O3 which redeposits on the trench sidewalls to inhibit redeposition of any Cu from the seed layer and prevent outward growth of the plated Cu that would result in overplating.
摘要翻译： 磁写头具有窄间距的电镀线圈，适用于高矫顽磁性介质的高频写入。 获得窄的间距没有诸如对现有技术尝试产生这种窄间距产生不利影响的过度镀敷的缺点。 产生磁写头的过程的特征在于使用O 2 / N 2的RIE等离子体蚀刻将电镀沟槽蚀刻成光致抗蚀剂的烘烤层，其中气体比例为5/45sccm，使得稀的O 2浓度不会产生不期望的侧面 蚀刻电镀槽。 此外，Cu籽晶层涂覆有Al 2 O 3的绝缘层，其重新沉积在沟槽侧壁上以抑制任何Cu从种子层的再沉积，并防止导致过镀的镀覆Cu的向外生长。
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