公开(公告)号：US10061139B2

公开(公告)日：2018-08-28

申请号：US14596790

申请日：2015-01-14

Applicant: Hewlett Packard Enterprise Development LP

Inventor： Jingjing Li ,  Nate Quitoriano ,  David A. Fattal ,  Raymond G. Beausoleil

IPC: G02B27/42 ,  G02B5/18 ,  H01L27/146 ,  G02B15/14 ,  G02B25/00

CPC classification number: G02B27/4216 ,  G02B5/1809 ,  G02B5/1861 ,  G02B5/1895 ,  G02B15/14 ,  G02B25/001 ,  G02B27/4272 ,  H01L27/1462 ,  H01L27/14625 ,  H01L27/14629

Abstract: Various embodiments of the present invention are directed to optical devices comprising planar lenses. In one aspect, an optical device includes two or more planar lenses, and one or more dielectric layers. Each planar lens includes a non-periodic, sub-wavelength grating layer, and each dielectric layer is disposed adjacent to at least one planar lens to form a solid structure. The two or more planar lenses are substantially parallel and arranged to have a common optical axis so that light transmitted through the optical device substantially parallel to the optical axis is refracted by the two or more planar lenses.

公开(公告)号：US10436956B2

公开(公告)日：2019-10-08

申请号：US15224417

申请日：2016-07-29

Applicant: HEWLETT PACKARD ENTERPRISE DEVELOPMENT LP

Inventor： David A Fattal ,  Jingjing Li ,  Raymond G Beausoleil ,  Marco Fiorentino

IPC: G02B5/18 ,  G02B27/00 ,  G03F7/00

Abstract: Examples include a method for fabricating a grating mirror using a computing device that comprises calculating a target phase change across the grating mirror. The target phase change may correspond to a target wavefront shape in a beam of light reflected from a grating patter. The method may also comprise generating the grating pattern comprising a plurality of lines with line widths, line period spacings, and line thicknesses corresponding to the target phase change across the grating mirror using the computing device. In such examples, a set of coordinates may be generated using the computing device with each coordinate identifying a location of a line of the plurality of lines, a line width of the line, a line period spacing of the line, and a line thickness of the line.