PLASMA PROCESSING METHOD
    1.
    发明申请

    公开(公告)号:US20250104981A1

    公开(公告)日:2025-03-27

    申请号:US18279818

    申请日:2022-06-08

    Abstract: Provided is a plasma processing method for implementing a state in which product manufacturing can be started in a short period of time by reducing particles generated after maintenance of a plasma processing apparatus. The plasma processing method for plasma-processing a sample includes: a sweeping step of sweeping out a particle after maintenance of a processing chamber in which the sample is plasma-processed; a deposition step of depositing a deposition film in the processing chamber after the sweeping step; a first removing step of removing the deposition film after the deposition step; a second removing step of removing fluorine in the processing chamber after the first removing step; and a plasma processing step of plasma-processing the sample placed on a sample stage. The sweeping step, the deposition step, the first removing step, and the second removing step are repeated two or more times before the plasma processing step.

    PLASMA PROCESSING APPARATUS
    2.
    发明申请

    公开(公告)号:US20230110096A1

    公开(公告)日:2023-04-13

    申请号:US17974727

    申请日:2022-10-27

    Abstract: To reduce the damage caused due to the degradation of sealing material without complicating the structure of the vacuum sealing material of the vacuum container and to perform cleaning without affecting the lifetime of the sealing material in a plasma processing apparatus, this invention provides a plasma processing apparatus in which a window portion and a processing chamber are coupled to each other with an elastomeric sealing material sandwiched therebetween, and a sealing material is arranged at a position where a ratio of a distance from the inner wall surface of a processing chamber in an interstice portion to the sealing material with respect to the interstice between the window portion and the processing chamber having the sealing material sandwiched there between is 3 or more, in a vacuum state with the air exhausted from the processing chamber by the vacuum exhaust unit.

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