公开(公告)号：US11211224B2

公开(公告)日：2021-12-28

申请号：US17049353

申请日：2018-04-26

申请人： HITACHI HIGH-TECH CORPORATION

发明人： Nobuhiro Okai ,  Daisuke Bizen ,  Tomoyasu Shojo ,  Naomasa Suzuki ,  Muneyuki Fukuda

IPC分类号： H01J37/244 ,  H01J37/147 ,  H01J37/28 ,  H01J37/12

摘要： To improve detection efficiency of secondary particles without increasing a size of a charged particle beam apparatus, a charged particle beam apparatus according to the invention includes: a charged particle beam source configured to irradiate a sample with a primary particle beam; a scanning deflector configured to scan and deflect the primary particle beam to a desired position of the sample; and a detector configured to detect secondary particles emitted from the desired position. The charged particle beam apparatus further includes: a focusing lens electrode arranged coaxially with the primary particle beam and configured to generate a focusing electric field that is an electric field that focuses a trajectory of the secondary particles; and a mesh electrode configured to reduce leakage of the focusing electric field on a trajectory of the primary particle beam.