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公开(公告)号：US10971328B2
公开(公告)日：2021-04-06
申请号：US16903658
申请日：2020-06-17
IPC分类号： H01J37/22 , H01J37/244 , H01J37/10 , H01J37/21 , H01J37/28
摘要： This charged particle beam device is provided with: a plurality of detectors for detecting secondary particles, the detectors being disposed in a symmetrical manner around the optical axis of a primary charged particle beam closer to the charged particle source side than an objective lens; electrodes for forming an electric field oriented in directions corresponding to each of the plurality of detectors, the electrodes being provided on the travel routes of secondary particles from a sample to the detectors; and a control power supply for applying a voltage to the electrodes. Adjusting the voltage applied to each of the electrodes makes it possible to detect, upon deflecting, the secondary particles, and to control the range of azimuths of the secondary particles to be detected.
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公开(公告)号：US11211224B2
公开(公告)日：2021-12-28
申请号：US17049353
申请日：2018-04-26
IPC分类号： H01J37/244 , H01J37/147 , H01J37/28 , H01J37/12
摘要： To improve detection efficiency of secondary particles without increasing a size of a charged particle beam apparatus, a charged particle beam apparatus according to the invention includes: a charged particle beam source configured to irradiate a sample with a primary particle beam; a scanning deflector configured to scan and deflect the primary particle beam to a desired position of the sample; and a detector configured to detect secondary particles emitted from the desired position. The charged particle beam apparatus further includes: a focusing lens electrode arranged coaxially with the primary particle beam and configured to generate a focusing electric field that is an electric field that focuses a trajectory of the secondary particles; and a mesh electrode configured to reduce leakage of the focusing electric field on a trajectory of the primary particle beam.
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公开(公告)号：US11239042B2
公开(公告)日：2022-02-01
申请号：US17060242
申请日：2020-10-01
发明人： Akira Ikegami , Yuta Kawamoto , Naomasa Suzuki , Manabu Yano , Yasushi Ebizuka , Naoma Ban
IPC分类号： H01J37/141 , H01J37/153 , H01J37/28 , H01J37/147 , H01J37/09
摘要： The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
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公开(公告)号：US10832886B2
公开(公告)日：2020-11-10
申请号：US16291090
申请日：2019-03-04
发明人： Akira Ikegami , Yuta Kawamoto , Naomasa Suzuki , Manabu Yano , Yasushi Ebizuka , Naoma Ban
IPC分类号： H01J37/141 , H01J37/153 , H01J37/28 , H01J37/147 , H01J37/09
摘要： The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
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公开(公告)号：US11852599B2
公开(公告)日：2023-12-26
申请号：US17382515
申请日：2021-07-22
发明人： Nobuhiro Okai , Naomasa Suzuki , Muneyuki Fukuda
IPC分类号： G01N23/2251 , G06T7/62 , G06T7/50 , G06N3/04 , H01J37/22
CPC分类号： G01N23/2251 , G06N3/04 , G06T7/50 , G06T7/62 , H01J37/222 , G01N2223/6116 , G06T2207/10061 , G06T2207/30148
摘要： Provided is an image processing system capable of estimating a three-dimensional shape of a semiconductor pattern or a particle by solving problems of measurement reduction in a height direction and taking an enormous amount of time at a time of acquiring learning data. The image processing system according to the disclosure stores a detectable range of a detector provided in a charged particle beam device in a storage device in advance, generates a simulated image of a three-dimensional shape pattern using the detectable range, and learns a relationship between the simulated image and the three-dimensional shape pattern in advance.
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