公开(公告)号：US10784074B2

公开(公告)日：2020-09-22

申请号：US15777121

申请日：2016-11-29

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Takeshi Sunaoshi ,  Yoshihisa Orai ,  Haruhiko Hatano ,  Takashi Mizuo

IPC: F25B19/00 ,  F25B9/00 ,  B01D8/00 ,  A61B18/02 ,  H01J37/20 ,  H01J37/28

Abstract: The invention is directed to a charged particle beam apparatus that enables temperature maintenance in a cooling unit provided inside a vacuum application apparatus using a refrigerant. The charged particle beam apparatus includes a cooling tank that contains a refrigerant for cooling a cooling unit, a cooling pipe that supplies the refrigerant from the cooling tank to the cooling unit, and a unit that leads the refrigerant to liquefy when the refrigerant is biased to a solid.