GLASS SUBSTRATE FOR MAGNETIC DISK AND MAGNETIC DISK FOR HEAT ASSISTED MAGNETIC RECORDING
    1.
    发明申请
    GLASS SUBSTRATE FOR MAGNETIC DISK AND MAGNETIC DISK FOR HEAT ASSISTED MAGNETIC RECORDING 有权
    用于磁辅助磁记录的磁盘和磁盘的玻璃基板

    公开(公告)号:US20160254018A1

    公开(公告)日:2016-09-01

    申请号:US15029117

    申请日:2013-10-31

    CPC classification number: G11B5/722 G11B5/7315 G11B5/84 G11B2005/0021

    Abstract: It is to provide a glass substrate for a magnetic disk to be a source of a magnetic disk for heat assisted magnetic recording and a magnetic disk for heat assisted magnetic recording which can restrain the occurrence of scratches when a magnetic head is in operation.A glass substrate for a magnetic disk to be a source of a magnetic disk for heat assisted magnetic recording includes a principal face on which an arithmetic average waviness Wa of a wavelength band of 1 to 3 mm is 2.15 Å or less.

    Abstract translation: 提供一种用于磁盘的玻璃基板作为用于热辅助磁记录的磁盘的源和用于热辅助磁记录的磁盘,其可以在磁头运行时抑制划痕的发生。 作为用于热辅助磁记录的磁盘源的磁盘用玻璃基板,其主面为1〜3mm的波长带的算术平均波纹度Wa为2.15以下。

    METHOD FOR PRODUCING GLASS SUBSTRATE FOR MAGNETIC DISK AND METHOD FOR MANUFACTURING MAGNETIC DISK
    2.
    发明申请
    METHOD FOR PRODUCING GLASS SUBSTRATE FOR MAGNETIC DISK AND METHOD FOR MANUFACTURING MAGNETIC DISK 审中-公开
    用于生产用于磁盘的玻璃基板的方法和用于制造磁盘的方法

    公开(公告)号:US20140248424A1

    公开(公告)日:2014-09-04

    申请号:US14275630

    申请日:2014-05-12

    CPC classification number: B24B7/241 C03C19/00 C03C23/0075 G11B5/8404

    Abstract: When mirror polishing is performed on a glass substrate by bringing a polishing pad into contact with the surface of the glass substrate while supplying a polishing liquid containing polishing grains to the substrate surface, the pH of the polishing liquid is maintained within a certain range or the agglomeration degree or dispersion degree of the polishing liquid is controlled. Consequently, an adequate mirror polishing rate can be maintained and there can be obtained a glass substrate having a good end shape.

    Abstract translation: 当在玻璃基板上进行镜面抛光时,通过使抛光垫与玻璃基板的表面接触,同时向衬底表面供给包含抛光颗粒的抛光液体,将抛光液的pH保持在一定范围内或 控制研磨液的附聚度或分散度。 因此,可以保持足够的镜面研磨速度,并且可以获得具有良好端部形状的玻璃基板。

Patent Agency Ranking