公开(公告)号：US20140248424A1

公开(公告)日：2014-09-04

申请号：US14275630

申请日：2014-05-12

Applicant: HOYA CORPORATION

Inventor： Toshio TAKIZAWA ,  Takumi KOSHIMIZU ,  Yoshinori MARUMO ,  Masahiro KATAGIRI

IPC: G11B5/84

CPC classification number: B24B7/241 ,  C03C19/00 ,  C03C23/0075 ,  G11B5/8404

Abstract: When mirror polishing is performed on a glass substrate by bringing a polishing pad into contact with the surface of the glass substrate while supplying a polishing liquid containing polishing grains to the substrate surface, the pH of the polishing liquid is maintained within a certain range or the agglomeration degree or dispersion degree of the polishing liquid is controlled. Consequently, an adequate mirror polishing rate can be maintained and there can be obtained a glass substrate having a good end shape.

Abstract translation: 当在玻璃基板上进行镜面抛光时，通过使抛光垫与玻璃基板的表面接触，同时向衬底表面供给包含抛光颗粒的抛光液体，将抛光液的pH保持在一定范围内或 控制研磨液的附聚度或分散度。 因此，可以保持足够的镜面研磨速度，并且可以获得具有良好端部形状的玻璃基板。