公开(公告)号：US20250148186A1

公开(公告)日：2025-05-08

申请号：US19011809

申请日：2025-01-07

Applicant: HUAWEI TECHNOLOGIES CO., LTD.

Inventor： Shoubo HU ,  Zhitang CHEN ,  Xiaopeng ZHANG ,  Shengyu ZHU ,  Pengyun LI ,  Jianxin MIAO ,  Yu HUANG

IPC: G06F30/398 ,  G06F111/08 ,  G06N3/0455

Abstract: This application relates to a method and an apparatus for determining a root-cause defect, and a storage medium. The method includes: obtaining a layout of a chip and diagnosis information of a defect in the chip; determining first feature information based on the layout and the diagnosis information; and determining, based on the first feature information by using a neural network model. With the described technology, both a design defect and a manufacturing defect of a chip can be considered, so that inference for a root cause is more comprehensive. In addition, an interaction relationship between complex root causes can be considered, so that a root-cause defect determined through inference is more accurate. In this way, assistance can be better provided in subsequent improvement of a chip-related design or a manufacturing technique, to reduce an increase in costs caused by a low yield rate.