公开(公告)号：US11448966B2

公开(公告)日：2022-09-20

申请号：US16633159

申请日：2018-08-02

申请人： HUAYING RESEARCH CO., LTD

发明人： Sophia Z. Wen ,  Fucheng Sun ,  Zhikai Wang

IPC分类号： C11D7/50 ,  G03F7/42 ,  B08B3/08 ,  C11D7/04 ,  C11D7/26 ,  C11D7/32 ,  C11D11/00 ,  H01L21/027

摘要： The present invention discloses a photoresist-removing solution comprising of an N-containing compound and an organic substance in a mass ratio of 1:(0.5-150). The N-containing compound includes at least one of the followings: tetraalkylammonium hydroxide, ammonia, liquid ammonia, and a mixture of ammonia and water; wherein the tetraalkylammonium hydroxide has the general formula (I): wherein R1, R2, R3, R4 is an alkyl with 1 to 4 carbons, respectively. The organic substance is an organic substance having at least one electron-withdrawing functional group. The present invention mixes a specific kind of N-containing compound and a specific kind of organic substance in a certain ratio, and preferably adds a certain amount of water, so that the removal liquid in the present application has an extremely excellent photoresist-removing effect.