公开(公告)号：US07391501B2

公开(公告)日：2008-06-24

申请号：US10763467

申请日：2004-01-22

申请人： Hai Deng ,  Yueh Wang ,  Huey-Chiang Liou ,  Hok-Kin Choi ,  Robert M. Meagley ,  Ernisse Putna

发明人： Hai Deng ,  Yueh Wang ,  Huey-Chiang Liou ,  Hok-Kin Choi ,  Robert M. Meagley ,  Ernisse Putna

IPC分类号： G03B27/54

CPC分类号： G03F7/2041 ,  G03F7/70341

摘要： Compositions for immersion liquid materials and associated immersion lithography systems and techniques. Examples of polymer or oligomer-based immersion liquids are described to exhibit superior material properties for immersion lithography in comparison with water and some other commonly-used immersion liquids. In addition, certain material additives may be added to water and water-based immersion liquids to improve the performance of the immersion liquids in immersion lithography.

摘要翻译： 用于浸没液体材料和相关浸没光刻系统和技术的组合物。 与水和一些其它常用的浸液相比，基于聚合物或低聚物的浸渍液体的实例被描述为具有优异的浸渍光刻材料性能。 此外，某些材料添加剂可以添加到水和水基浸液中以改善浸没式光刻中的浸液的性能。