公开(公告)号：US4649860A

公开(公告)日：1987-03-17

申请号：US713743

申请日：1985-03-19

申请人： Heisaburo Furukawa ,  Kanji Wake ,  Yoshio Shimozato ,  Kenichi Yanagi ,  Mitsuo Kato ,  Tetsuyoshi Wada ,  Norio Tsukiji ,  Takuya Aiko ,  Toshiharu Kittaka ,  Yasuji Nakanishi

发明人： Heisaburo Furukawa ,  Kanji Wake ,  Yoshio Shimozato ,  Kenichi Yanagi ,  Mitsuo Kato ,  Tetsuyoshi Wada ,  Norio Tsukiji ,  Takuya Aiko ,  Toshiharu Kittaka ,  Yasuji Nakanishi

IPC分类号： C23C14/26 ,  C23C14/56 ,  C23C13/08

CPC分类号： C23C14/562

摘要： A vacuum evaporation equipment for continuous vacuum evaporation of a metal onto a band or strip of product including at least one vacuum sealing station, provision of ducts that are disposed surrounding the band product and extending from the point of vapor deposition where the band product is subjected to a vacuum evaporation process an a chamber held at a reduced pressure or vacuum state to the extent that substantially no reevaporation of once deposited metal is effectively prevented from occurring. The ducts are adapted to be heated to a temperature substantially higher than the temperature of the steel band product. In addition, there is provided at least one vacuum sealing station with rolls rotatably mounted in the interior of a casing and a complementary sealing bar mounted in a complementary engagement relationship with the rolls having a close gap therebetween. A side panel is mounted self-adjustably in sliding motion in the longitudinal direction along the axes of the rolls on the opposite ends thereof, and heaters are provided to heat the rolls, sealing bar and side panel, respectively.

摘要翻译： 一种用于将金属连续真空蒸发到包括至少一个真空密封站的产品带或条带上的真空蒸发设备，提供围绕带产品设置并从带状产品所受到的气相沉积点延伸的管道 在真空蒸发过程中，保持在减压或真空状态的室被有效地防止发生一次沉积的金属的基本上不再蒸发。 管道适于被加热到显着高于钢带产品的温度的温度。 此外，提供了至少一个具有可旋转地安装在壳体内部的辊的真空密封站和与辊之间具有紧密间隙的互补啮合关系安装的互补密封条。 侧板在其相对端沿辊的轴线沿纵向方向自由调节地安装，并且分别设置加热器以加热辊，密封条和侧板。

公开(公告)号：US4552092A

公开(公告)日：1985-11-12

申请号：US652676

申请日：1984-09-19

申请人： Kenichi Yanagi ,  Toshio Taguchi ,  Tetsuyoshi Wada ,  Heisaburo Furukawa ,  Kanji Wake

发明人： Kenichi Yanagi ,  Toshio Taguchi ,  Tetsuyoshi Wada ,  Heisaburo Furukawa ,  Kanji Wake

IPC分类号： C23C14/56 ,  C23C14/24

CPC分类号： C23C14/562

摘要： A vacuum vapor deposition system including a high-vacuum vapor deposition chamber provided with a rotary cell around which band steel is wound as it is passed through the chamber. A crucible for molten metal has a hood for guiding vapor of said metal to a vapor deposition port opposed to the rotary cell, and arcuate covers connected to the hood at the entrance and exit positions of the band steel. The vapor deposition port is spaced slightly from the rotary cell so that the covers will not come into contact with the band steel. A heater is provided for heating the surface of the rotary cell up to a temperature equal to or higher than a reevaporation temperature of the metal under a vapor pressure of the vapor of the metal in the proximity of the rotary cell so that the metal will not be deposited onto the opposite end portions of the rotary cell which are not covered by the band steel. A heater is also provided for heating the surfaces of the hood and the covers up to a temperature equal to or higher than such reevaporation temperature of the metal so that metal will not be deposited onto the hood and the covers.

摘要翻译： 一种真空蒸镀系统，其特征在于，具有高真空蒸镀室，该真空蒸镀室设置有旋转槽，当所述旋转槽通过所述室时，带钢被卷绕。 用于熔融金属的坩埚具有用于将所述金属的蒸气引导到与旋转单元相对的气相沉积端口的罩，以及在带钢的入口和出口位置连接到罩的弓形盖。 气相沉积端口与旋转单元稍微间隔开，使得盖不会与带钢接触。 提供一种加热器，用于在旋转电池附近的金属蒸汽的蒸汽压力下，将旋转电池的表面加热至等于或高于金属的蒸发温度的温度，使金属不会 沉积在不被带钢覆盖的旋转电池的相对端部上。 还提供加热器，用于将罩和盖的表面加热到等于或高于金属的这种再蒸发温度的温度，使得金属不会沉积到罩和盖上。

公开(公告)号：US5169451A

公开(公告)日：1992-12-08

申请号：US766766

申请日：1991-09-27

申请人： Kenichi Yanagi ,  Toshio Taguchi ,  Yoshiteru Moriyama ,  Mitsuhiko Sako ,  Takuya Akio ,  Shinji Kamura ,  Heisaburo Furukawa ,  Kenji Atarashiya ,  Seiji Yokoro

发明人： Kenichi Yanagi ,  Toshio Taguchi ,  Yoshiteru Moriyama ,  Mitsuhiko Sako ,  Takuya Akio ,  Shinji Kamura ,  Heisaburo Furukawa ,  Kenji Atarashiya ,  Seiji Yokoro

IPC分类号： C23C14/24 ,  C23C14/56

CPC分类号： C23C14/562 ,  C23C14/243

摘要： An improved vacuum vapor-deposition apparatus comprises an evaporation tank for holding and evaporating vapor deposition material, a hood covering the top of the evporation tank and extended up to its outside in the horizontal direction, inlet and outlet ports of a band to be vapor-deposited, which are opened in the hood so as to penetrate a central portion of the extension on the outside of the evaporation tank, and a vacuum tank covering the evaporation tank and the hood entirely and having sealing devices for carrying in and carrying out the band to be vapor-deposited at the positions corresponding to the inlet and outlet ports in the hood. Vapor deposition is effected within the hood simultaneously onto the both front and rear surfaces of the band to be vapor-deposited. Preferably, the vacuum vapor-deposition apparatus further comprises a vapor amount control device for controlling a vapor amount of the evaporated material led to the both front and rear sides of the band to be vapor-deposited within the hood, and a vapor-deposited surface area control device provided at least on one side of the front and rear sides of the band to be vapor-deposited within the hood for controlling a vapor-deposited surface area of the band to be vapor-deposited. Then, vapor-deposition of different thickness is effected within the hood onto the front and rear surfaces of the band to be vapor-deposited.