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    Ion beam deposition targets having an interlocking interface and a replaceable insert
    1.
    发明授权
    Ion beam deposition targets having an interlocking interface and a replaceable insert 有权
    离子束沉积靶具有互锁界面和可更换插入物

    公开(公告)号：US06755944B2

    公开(公告)日：2004-06-29

    申请号：US10004212

    申请日：2001-11-02

    申请人： Henry L. Grohman ,  Robert Acker ,  Matthew T. Wilson

    发明人： Henry L. Grohman ,  Robert Acker ,  Matthew T. Wilson

    IPC分类号： C23C1434

    CPC分类号： C23C14/3407

    摘要： An ion beam deposition target source consisting of a removable, centrally located inner insert surrounded by an outer region. The insert can be removed and replaced when eroded, while the outer region of the target source not eroded by the ion beam remains in place attached to a backing plate. The inner insert and the outer region are joined to each other by an interface comprising an interlocking lip or grove structure located on opposing mating surfaces on the inner insert and outer region, thereby forming the deposition target source when these components are united. The deposition target source can be attached by a bonding layer to a backing plate which is installed into an ion beam deposition machine.

    摘要翻译： 一种离子束沉积靶源，由一个由外部区域包围的可拆卸的位于中心的内部插入件组成。 当被侵蚀时，可以移除和更换插入件，而未被离子束侵蚀的目标源的外部区域保持在附接到背板的位置。 内部插入件和外部区域通过包括位于内部插入件和外部区域上的相对配合表面上的互锁唇缘或凹槽结构的界面彼此连接，从而当这些部件组合时形成沉积靶材源。 沉积靶材源可以通过粘合层附着到安装到离子束沉积机中的背板上。