公开(公告)号：US20070022957A1

公开(公告)日：2007-02-01

申请号：US11530965

申请日：2006-09-12

申请人： Hideki KOMORI ,  Masao SUMIYOSHI ,  Toshio TANAKA ,  Miharu KAWASHIMA

发明人： Hideki KOMORI ,  Masao SUMIYOSHI ,  Toshio TANAKA ,  Miharu KAWASHIMA

IPC分类号： C23C16/00

CPC分类号： C23C14/564 ,  C23C14/26 ,  C23C14/30

摘要： A vacuum deposition system comprises a vacuum vessel, an evaporation source holder located in the vacuum vessel for holding an evaporation source and a holding jig provided in the vacuum vessel for holding a substrate facing the evaporation source. An adhesion-prevention member is located at outer peripheries of the evaporation source and the holding jig along an inner wall of the vacuum vessel. The adhesion-prevention member is spaced from the inner wall of the vacuum vessel. The adhesion-prevention member includes members slanted diagonally downward from the central part toward the inner wall. Thereby, the adhesion-prevention member prevents an evaporant from the evaporation source from adhering to the inner wall of the vacuum vessel. A heater on the adhesion-prevention member heats the adhesion-prevention member to exfoliate particles that are deposited to the adhesion-prevention member.

摘要翻译： 真空沉积系统包括真空容器，位于真空容器中的用于保持蒸发源的蒸发源保持器和设置在真空容器中用于保持面对蒸发源的基板的保持夹具。 防粘附构件沿着真空容器的内壁位于蒸发源和保持夹具的外周。 防粘附构件与真空容器的内壁隔开。 防粘接构件包括从中心部朝向内壁倾斜向下倾斜的构件。 因此，防粘接部件防止蒸发源蒸发剂粘附到真空容器的内壁。 防粘附构件上的加热器加热粘合防止构件以剥离沉积到防附着构件上的颗粒。