LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, ILLUMINATING METHOD, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING OPTICAL APPARATUS
    2.
    发明申请
    LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, ILLUMINATING METHOD, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING OPTICAL APPARATUS 有权
    光源装置,光学装置,曝光装置,装置制造方法,照射方法,曝光方法和制造光学装置的方法

    公开(公告)号:US20130128248A1

    公开(公告)日:2013-05-23

    申请号:US13639037

    申请日:2011-03-31

    IPC分类号: G02B19/00 G03F7/20

    摘要: An optical apparatus capable of illuminating an irradiation surface under a required illumination condition capable of achieving a high light efficiency while keeping a small light loss due to, for example, the overlap error of illuminating fields. The optical apparatus, which illuminates a first area with light from a light source while the first area is longer in a second direction intersecting a first direction than in the first direction, includes a collector optical member which is arranged in an optical path between the light source and the first area, and condenses the light from the light source to form a second area in a predetermined plane, the second area being longer in a fourth direction intersecting a third direction than in the third direction; and a first fly's eye optical member which is provided within the predetermined plane including the second area, and has a plurality of first optical elements guiding the light of the collector optical member to the first area.

    摘要翻译: 一种能够在能够实现高光效的所需照明条件下照射照射面的光学装置,同时由于例如照明场的重叠误差而保持小的光损失。 在与第一方向相交的第二方向上比第一方向交叉的第二方向长的情况下,来自光源的光照射第一区域的光学装置包括集光器部件,其配置在光 源极和第一区域,并且聚集来自光源的光以在预定平面中形成第二区域,第二区域在与第三方向相交的第四方向上与第三方向相交更长; 以及第一飞眼光学构件,其设置在包括第二区域的预定平面内,并且具有将聚光器光学构件的光引导到第一区域的多个第一光学元件。

    Reflective imaging optical system, exposure apparatus, and method for producing device
    3.
    发明授权
    Reflective imaging optical system, exposure apparatus, and method for producing device 有权
    反射成像光学系统,曝光装置及其制造方法

    公开(公告)号:US09075322B2

    公开(公告)日:2015-07-07

    申请号:US13225629

    申请日:2011-09-06

    申请人: Yoshio Kawabe

    发明人: Yoshio Kawabe

    IPC分类号: G03B27/54 G03F7/20

    CPC分类号: G03F7/70233

    摘要: An reflective imaging optical system of the far pupil type, which is applicable to an exposure apparatus using for example the EUV light, forms on a second plane an image of a predetermined area on a first plane and is provided with first to eighth reflecting mirrors arranged in an order of reflection from the first plane toward the second plane. An entrance pupil of reflective imaging optical system is positioned on a side opposite to the reflective imaging optical system with the first plane intervening therebetween; and the following condition is fulfilled provided that PD represents a distance along an optical axis between the entrance pupil and the first plane, TT represents a distance along the optical axis between the first plane and the second plane, and R represents an angle of incidence of a main light beam coming into the first plane: −14.3

    摘要翻译: 适用于使用例如EUV光的曝光装置的远光瞳型的反射成像光学系统在第二平面上形成在第一平面上的预定区域的图像,并且设置有布置在第一至第八反射镜 以从第一平面朝向第二平面的反射的顺序。 反射成像光学系统的入射光瞳位于与反射成像光学系统相对的一侧,其中介于其间的第一平面; 并且如果PD表示沿着入射光瞳和第一平面之间的光轴的距离,则TT表示沿着第一平面和第二平面之间的光轴的距离,并且R表示入射光瞳和第一平面之间的距离 进入第一平面的主光束:-14.3 <(PD / TT)/ R <-2.5。

    ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
    4.
    发明申请
    ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
    照明光学装置,曝光装置和装置制造方法

    公开(公告)号:US20120188526A1

    公开(公告)日:2012-07-26

    申请号:US13498810

    申请日:2010-09-29

    IPC分类号: G03B27/54

    CPC分类号: G02B17/0663 G03F7/70116

    摘要: An illumination optical apparatus includes an integrator optical device that includes a first element group (230A) prescribing a first illumination condition and a second element group (230B) prescribing a second illumination condition other than the first illumination condition and an irradiation device (40) that selectively directs light to the first element group or the second element group.

    摘要翻译: 照明光学装置包括积分器光学装置,其包括规定第一照明条件的第一元件组(230A)和规定第一照明条件以外的第二照明条件的第二元件组(230B)和照射装置(40), 选择性地将光引导到第一元件组或第二元件组。

    Optical integrator, illumination optical system, exposure apparatus, and device manufacturing method
    5.
    发明授权
    Optical integrator, illumination optical system, exposure apparatus, and device manufacturing method 有权
    光学积分器,照明光学系统,曝光装置和器件制造方法

    公开(公告)号:US08497977B2

    公开(公告)日:2013-07-30

    申请号:US12706586

    申请日:2010-02-16

    申请人: Yoshio Kawabe

    发明人: Yoshio Kawabe

    IPC分类号: G03B27/54 G21K5/04

    CPC分类号: G03F7/70083 G03F7/70075

    摘要: An optical integrator used in an illumination optical system for illuminating an illumination target surface on the basis of light from a light source has a first fly's eye optical system having a plurality of first optical elements arranged in parallel at a position optically conjugate with the illumination target surface in an optical path between the light source and the illumination target surface, and a second fly's eye optical system having a plurality of second optical elements arranged in parallel so as to correspond to the plurality of first optical elements in an optical path between the first fly's eye optical system and the illumination target surface. At least one first optical element out of the plurality of first optical elements, and another first optical element different from the at least one first optical element have their respective postures different from each other about an optical axis of the illumination optical system or about an axis parallel to the optical axis.

    摘要翻译: 用于照明光学系统的光学积分器,用于基于来自光源的光来照射照明目标表面具有第一飞眼光学系统,其具有多个第一光学元件,所述第一光学系统在与照射目标光学共轭的位置处平行布置 光源和照射目标表面之间的光路中的表面;以及第二蝇眼光学系统,具有多个平行布置的第二光学元件,以便在第一和第二光学元件之间的光路中对应于多个第一光学元件 飞眼光学系统和照明目标表面。 多个第一光学元件中的至少一个第一光学元件和与该至少一个第一光学元件不同的另一个第一光学元件具有彼此围绕照明光学系统的光轴彼此不同的姿态,或者围绕轴线 平行于光轴。