公开(公告)号：US5015558A

公开(公告)日：1991-05-14

申请号：US391035

申请日：1989-08-09

申请人： Hideo Ochi ,  Tomoyuki Kitaori

发明人： Hideo Ochi ,  Tomoyuki Kitaori

IPC分类号： C08F212/14 ,  C08F12/00 ,  G03F7/038

CPC分类号： G03F7/038 ,  G03F7/0388

摘要： A novel copolymer containing a plurality of first and second monomer units having the following general formulas (I) and (II), respectively: ##STR1## wherein R.sub.1 stands for hydrogen or methyl and Ar stands for an aryl, ##STR2## wherein R.sub.2 stands for hydrogen or methyl and X stands for -CH.sub.2 CH.sub.2 -, -CH.sub.2 CH(OH)CH.sub.2 - or -CH.sub.2 CH(CH.sub.2 OH)- and Y stands for o- or p-chlorophenyl, the molar ratio of the first monomer unit to the second monomer unit being 94:6 to 98:2. The copolymer becomes insoluble to a developing liquid when exposed to high energy radiations and is used for forming resist pattern on a silicon wafer or the like substrate.