摘要:
Disclosed is a heat-sensitive sheet for stencil printing comprising a laminate of a thermoplastic resin film and a porous support mainly composed of synthetic fibers, the sheet having a wet tensile strength in the machine direction of 200 gf/cm or higher, a KES bending rigidity B value in the machine or cross direction of 0.02 g·cm2/cm or higher, and a PPS smoothness determined when a film is pressed against the surface of the porous support of the sheet of 0.9 &mgr;m or higher; the sheet has an excellent runnability, occurrence of wrinkles on the sheet when it is wound around a drum of a stencil printing machine is efficiently prevented, and elongation of the sheet is repressed and occurrence of wrinkles on the sheet can be prevented even when a large number of paper sheets are printed, and thus printed paper sheets having sharp images excellent in reproducibility of a manuscript can be provided.
摘要:
An ink supplying roller (17) is disposed in a rotary cylindrical drum (16), and is moved so that the ink supplying roller (17) can be brought into contact with an inner peripheral surface of a cylindrical circumferential wall (15). The ink supplying roller (17) is placed at a contact position with an ink permeable portion (15a) of the circumferential wall (15). The rotary cylindrical drum (16) is rotated in a state in which a stencil sheet (M) is not wound around the rotary cylindrical drum (16). Therefore, ink (50) drawn out through the ink permeable portion to the outer peripheral surface of the circumferential wall (15) because the stencil sheet (M) is peeled off at the stencil discharging operation is pulled into the ink permeable portion of the circumferential wall (15) by negative pressure produced by the ink supplying roller (17) coming in contact with the inner peripheral surface of the circumferential wall (15) and is removed.
摘要:
A heat-sensitive stencil sheet is provided, which is inhibited from jamming at the time of carrying or creasing at the time of winding around a drum, and thus excellent in carrying property and winding property. This heat-sensitive stencil sheet comprises a laminate of a thermoplastic resin film and a porous substrate mainly composed of synthetic fibers, and satisfies 0.150≦T−H wherein T denotes an arithmetic average value (g·cm/cm) of absolute values of KES bending torque in lengthwise direction of the stencil sheet at curvatures of +2.3 and −2.3 cm−1, H denotes a bending hysteresis (g·cm/cm), and T−H denotes a residual torque (g·cm/cm).
摘要:
An individually wrapped absorbent article that is wrapped in a wrapping sheet wherein the wrapping sheet has a colored part on the inner surface on the side of the absorbent article, and the colored part of the wrapping sheet can be seen from the outside of the individually wrapped product but the absorbent article cannot be seen from the outside of the individually wrapped product.
摘要:
An absorbent article includes a front wing unit which is provided outside in a widthwise direction of the absorbent article more than an absorber, and extends to the outside in the widthwise direction of the absorber in an inside leg region which corresponds to an inside leg portion of a wearer; and a gather which is provided at each of edges of the absorber, which extends along a longitudinal direction of the absorbent article, and which prevents a bodily fluid of the wearer from leaking from the absorbent article. The front wing unit has a base part which is positioned at an innermost side in a widthwise direction of the absorbent article in the front wing unit; and the leakage gather extends to the outside in the widthwise direction of the absorbent article more than the base part as seen in plan view of the absorbent article.
摘要:
A NAND nonvolatile semiconductor memory device that has a memory cell array region and a selection gate region, has a semiconductor layer; a gate insulating film disposed on said semiconductor layer; a plurality of first electrode layers selectively disposed on said gate insulating film; a first device isolation insulating film formed in said memory cell array region and extends from between said adjacent first electrode layers into said semiconductor layer for device isolation; a second device isolation insulating film formed in said selection gate region and extends from between said adjacent first electrode layers into said semiconductor layer for device isolation; an interpoly insulating film formed at least on the top of said first electrode layers and said first device isolation insulating film in said memory cell array region; a second electrode layer disposed on said interpoly insulating film; and a third electrode layer disposed on said second electrode layer, said second device isolation insulating film and the first electrode layers in said selection gate region, wherein the height of the top surface of said second device isolation insulating film is greater than the height of the top surface of said first device isolation insulating film.
摘要:
A manufacturing method of a semiconductor device disclosed herein, comprises: forming a first member to be patterned on a semiconductor substrate; forming a second member to be patterned on the first member; forming a third member to be patterned on the second member; patterning the third member to form a first line pattern and a first connecting portion in the third member, the first line pattern having a plurality of parallel linear patterns and the first connecting portion connecting the linear patterns on at least one end side of the linear patterns of the first line pattern; etching the second member with the third member as a mask to form a second line pattern and a second connecting portion in the second member, the second line pattern being the same pattern as the first line pattern and the second connecting portion being the same pattern as the first connecting portion; removing the second connecting portion of the second member; and etching the first member with the second member as a mask.
摘要:
A method of manufacturing a semiconductor device includes forming a plurality of dummy line patterns arranged at a first pitch on an underlying region, forming first mask patterns having predetermined mask portions formed on long sides of the dummy line patterns, each of the first mask patterns having a closed-loop shape and surrounding each of the dummy line patterns, removing the dummy line patterns, forming a second mask pattern having a first pattern portion which covers end portions of the first mask patterns and inter-end portions each located between adjacent ones of the end portions, etching the underlying region using the first mask patterns and the second mask pattern as a mask to form trenches each located between adjacent ones of the predetermined mask portions, and filling the trenches with a predetermined material.
摘要:
A semiconductor memory device, having at least one floating gate, includes a semiconductor substrate; at least one device-isolation region buried in the semiconductor substrate, having a top surface protruding from a top surface of the semiconductor substrate, the top surface of the device isolation region having a concave section that has a depression thereon; at least one gate-insulating film formed on the semiconductor substrate; a first gate formed on the gate-insulating film, the device-isolation region and the depression; a gate-to-gate insulating film formed on the first gate and in the concave section and the depression of the device-isolation region; and a second gate formed on the gate-to-gate insulation film, the depression being filled with the second gate.
摘要:
A stencil printing machine having an exfoliation suction apparatus including a case having a guide plate at its upper face, a suction force generating portion provided at the case and an exfoliation suction port provided at one end portion of the guide plate for constituting suction force for exfoliating print sheet from a printing drum by suction force by the suction force generating portion in which the exfoliation suction port is arranged to be proximate to a press roller orthgonally to a center line of a squeegee roller intersecting with an axis line of the printing drum and on a lower side of a reference line passing through a position of bringing the press roller and into press contact with the printing drum.