公开(公告)号：US07751037B2

公开(公告)日：2010-07-06

申请号：US12435523

申请日：2009-05-05

申请人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

发明人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC分类号： G01N21/958 ,  G01N21/88

CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

摘要翻译： 提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括放置基板样本并可在X-Y-Z-中的每个中任意移动的台部; 方向，用于利用来自倾斜方向的光照射电路图案的照明系统，以及用于从上下方向在检测器上形成照射的检测区域的图像的图像形成光学系统。 利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

公开(公告)号：US07528942B2

公开(公告)日：2009-05-05

申请号：US11472426

申请日：2006-06-22

申请人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

发明人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC分类号： G01N21/88

CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

摘要翻译： 提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括：载置基板试样的载台部分，其可以在XYZ-θ方向中任意移动;照射系统，用于利用来自倾斜方向的光照射电路图案;以及图像形成 光学系统，用于从上下方向在检测器上形成照射的检测区域的图像。 利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

公开(公告)号：US08462330B2

公开(公告)日：2013-06-11

申请号：US13362808

申请日：2012-01-31

申请人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

发明人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC分类号： G01N21/88

CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

摘要： A method and apparatus for detecting defects are provided for detecting defects or foreign matter on an object to be inspected. The apparatus includes a movable stage for mounting a specimen, an illumination system for irradiating a circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. A spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip.

摘要翻译： 提供一种用于检测缺陷的方法和装置，用于检测被检测物体上的缺陷或异物。 该装置包括用于安装样本的可移动台，用于从倾斜方向的光照射电路图案的照明系统和用于从上方和倾斜形成检测器上的照射检测区域的图像的图像形成光学系统 方向。 利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。 由检测器接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。

公开(公告)号：US08107065B2

公开(公告)日：2012-01-31

申请号：US12831102

申请日：2010-07-06

申请人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

发明人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC分类号： G01N21/88

CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

摘要翻译： 提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括放置基板样本并可在X-Y-Z-中的每个中任意移动的台部; 方向，用于利用来自倾斜方向的光照射电路图案的照明系统，以及用于从上下方向在检测器上形成照射的检测区域的图像的图像形成光学系统。 利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

公开(公告)号：US20120194809A1

公开(公告)日：2012-08-02

申请号：US13362808

申请日：2012-01-31

申请人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

发明人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC分类号： G01N21/956

CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

摘要： A method and apparatus for detecting defects are provided for detecting defects or foreign matter on an object to be inspected. The apparatus includes a movable stage for mounting a specimen, an illumination system for irradiating a circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. A spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip.

摘要翻译： 提供一种用于检测缺陷的方法和装置，用于检测被检测物体上的缺陷或异物。 该装置包括用于安装样本的可移动台，用于从倾斜方向的光照射电路图案的照明系统和用于从上方和倾斜形成检测器上的照射检测区域的图像的图像形成光学系统 方向。 利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。 由检测器接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。

公开(公告)号：US20090213366A1

公开(公告)日：2009-08-27

申请号：US12435523

申请日：2009-05-05

申请人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

发明人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC分类号： G01N21/958

CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

摘要翻译： 提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括：载置基板试样的载台部分，其可以在XYZ-θ方向中任意移动;照射系统，用于利用来自倾斜方向的光照射电路图案;以及图像形成 光学系统，用于从上下方向在检测器上形成照射的检测区域的图像。 利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

公开(公告)号：US20060290923A1

公开(公告)日：2006-12-28

申请号：US11472426

申请日：2006-06-22

申请人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

发明人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC分类号： G01N21/88

CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

公开(公告)号：US20070177136A1

公开(公告)日：2007-08-02

申请号：US11653322

申请日：2007-01-16

申请人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

发明人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC分类号： G01N21/88

CPC分类号： G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

摘要： A defect inspection apparatus includes an irradiation optical system 20, a detection optical system 30, and an image processor 40. In the irradiation optical system, a mirror 2603 is disposed to reflect downward a beam flux that has been guided to a first or second optical path, and a cylindrical lens 251 and an inclined mirror 2604 are disposed to focus the beam flux that has been directed downward by the mirror, at an inclination angle from a required oblique direction extending horizontally, onto a substrate 1 to be inspected, as a slit-shaped beam 90.

摘要翻译： 缺陷检查装置包括照射光学系统20，检测光学系统30和图像处理器40。 在照射光学系统中，设置反射镜2603以向下反射已经被引导到第一或第二光路的光束，并且设置柱面透镜251和倾斜镜2604以聚焦已导向的光束 作为狭缝状光束90，通过反射镜向下倾斜，从与水平方向延伸的所需倾斜方向倾斜的角度，到被检查的基板1上。

公开(公告)号：US20110063603A1

公开(公告)日：2011-03-17

申请号：US12950243

申请日：2010-11-19

申请人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

发明人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC分类号： G01N21/88 ,  G01J4/00

CPC分类号： G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

摘要： A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.

摘要翻译： 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。

公开(公告)号：US20090122303A1

公开(公告)日：2009-05-14

申请号：US12328357

申请日：2008-12-04

申请人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

发明人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC分类号： G01N21/88

CPC分类号： G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

摘要： A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.

摘要翻译： 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。