公开(公告)号：US20230238210A1

公开(公告)日：2023-07-27

申请号：US18151530

申请日：2023-01-09

Applicant: Hitachi High-Tech Corporation

Inventor： Hiroaki KASAI ,  Kenji YASUI ,  Mayuka OSAKI ,  Maki KIMURA ,  Makoto SUZUKI

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/28 ,  H01J2237/2804 ,  H01J2237/24495 ,  H01J2237/24578

Abstract: The invention provides an observation system capable of observing a formation position of a target shape that cannot be directly irradiated with an electron beam. The observation system includes an electron microscope and a computer. The electron microscope is configured to irradiate, with an electron beam, a first surface position on a specimen, which is different from a formation position of a target shape on the specimen, detect predetermined electrons that are scattered in the specimen from the first surface position and that escape from the formation position of the target shape to an outside of the specimen, and output the predetermined electrons as a detection signal. The computer is configured to output one or more values related to the target shape based on the detection signal.